Chemical Formula: Ti
Catalog Number: ST0404
CAS Number: 7440-32-6
Purity: 99.9%-99.999%
Thermal Conductivity: 21.9 W/m.K
Melting Point (°C): 1,660
Coefficient of Thermal Expansion: 8.6 x 10-6/K
W | L | T | GW | |
Dimension | 70” | 90” | 1/2” | < 450 lbs |
Related Product: Titanium (Ti) Sputtering Target
Related Post: How was titanium discovered? | History of Titanium
Our materials are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
Stanford Advanced Materials specializes in producing high purity Planar Titanium sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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