Chemical Formula: C
Catalog Number: ST0018
CAS Number: 7782-42-5
Purity: 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The carbon graphite sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is a trusted sputtering target supplier working with international partners to bring you the highest quality products.
The carbon graphite sputtering target is a black non-metallic sputtering target composed of high purity carbon graphite. Carbon graphite is one of three forms of elemental carbon found in nature, and the other two forms are diamond and coal. Carbon (C) is a chemical element that originated from the Latin ‘carbo’, meaning charcoal. It was early used in 3750 BC and discovered by Egyptians and Sumerians. “C” is the canonical chemical symbol of carbon. Its atomic number in the periodic table of elements is 6 with a location at Period 2 and Group 14, belonging to the p-block. The relative atomic mass of carbon is 12.0107(8) Dalton, the number in the brackets indicating the uncertainty.
|Melting Point||3652 – 3697 °C|
|Boiling Point||4200 °C|
|Thermal Conductivity||140 W/m.K|
|Coefficient of Thermal Expansion||7.1 x 10-6/K|
|Comments||E-beam preferred. Arc evaporation. Poor film adhesion.|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
The carbon graphite sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
The applications for carbon include its use as an alloying element with iron in the manufacture of steel, its use as brushes in electrical generators and motors, the use of colloidal graphite or carbon to coat surfaces (e.g. glass), in electrical assemblies to absorb microwaves and inhibit photoelectrons and secondary electrons, and the use of high purity carbon (graphite) in nuclear reactors to moderate neutrons.
Indium Bonding is recommended for carbon graphite sputtering targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our carbon graphite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
SAM’s carbon graphite sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film deposition materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.
Submit your review
So much high quality for such a cheap price. Came exactly as described and good quality.