(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0477 Zinc Oxide with Manganese Sputtering Target, ZnO 0.3 wt% Mn

Chemical Formula: ZnO 0.3 wt% Mn, ZnO4 wt% Mn
Catalog Number: ST0477
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Zinc Oxide with Manganese Sputtering Targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.




Description

Zinc Oxide with Manganese Sputtering Target Description

Zinc Oxide with Manganese Sputtering Target is composed of zinc, manganese, and oxygen. High-purity zinc oxide with manganese sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Zinc Oxide Sputtering TargetManganese Sputtering TargetOxide Ceramic Sputtering Target

Zinc Oxide with Manganese Sputtering Target Specification

Material Type Zinc Oxide with Manganese
Symbol ZnO 0.3 wt% Mn
Color/Appearance Solid
Melting Point /
Density /
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Zinc Oxide with Manganese Sputtering Target Application

Zinc Oxide with Manganese Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Zinc Oxide with Manganese Sputtering Target Packaging

Our Zinc Oxide with Manganese Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high-purity Zinc Oxide with Manganese Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

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Zinc Oxide with Manganese Sputtering Target
Average rating:  
 1 reviews
by Land Hansen on Zinc Oxide with Manganese Sputtering Target

Delivered as promised. Worked well for my experiments.