Chemical Formula: ZnO/Al2O3
Catalog Number: ST0204
CAS Number: 1314-13-2 | 1344
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Indium Bonding and Elastomeric Target Bonding Service are available for Zinc Oxide with Alumina sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Material | Size |
Zinc Oxide with Alumina, ZnO / Al2O3 | 2.00″ Dia. x 0.125″ Thick |
Zinc Oxide with Alumina, ZnO / Al2O3 | 2.00″ Dia. x 0.250″ Thick |
Zinc Oxide with Alumina, ZnO / Al2O3 | 3.00″ Dia. x 0.125″ Thick |
Zinc Oxide with Alumina, ZnO / Al2O3 | 3.00″ Dia. x 0.250″ Thick |
Zinc Oxide with Alumina, ZnO / Al2O3 | 4.00″ Dia. x 0.125″ Thick |
Zinc Oxide with Alumina, ZnO / Al2O3 | 4.00″ Dia. x 0.250″ Thick |
Zinc Oxide with Alumina, ZnO / Al2O3 | 5.00″ Dia. x 0.125″ Thick |
Zinc Oxide with Alumina, ZnO / Al2O3 | 5.00″ Dia. x 0.250″ Thick |
Zinc Oxide with Alumina, ZnO / Al2O3 | 6.00″ Dia. x 0.125″ Thick |
Zinc Oxide with Alumina, ZnO / Al2O3 | 6.00″ Dia. x 0.250″ Thick |
Our Zinc Oxide with Alumina Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high purity Zinc Oxide with Alumina Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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