ST0460 Neodymium Nickel Oxide (NdNiO3) Sputtering Target

Target Bonding of Neodymium Nickel Oxide Sputtering Target

Target Bonding Service is available for Neodymium Nickel Oxide Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.

Available Sizes of Neodymium Nickel Oxide Sputtering Target

Description of Neodymium Nickel Oxide Sputtering Target

Neodymium

Neodymium is a chemical element originated from the Greek ‘neos didymos’ meaning new twin. It was first mentioned in 1885 and observed by A. von Welsbach. “Nd” is the canonical chemical symbol of neodymium. Its atomic number in the periodic table of elements is 60 with location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of neodymium is 144.242(3) Dalton, the number in the brackets indicating the uncertainty.

Nickel

Nickel is a chemical element originated from the shortened of the German ‘kupfernickel’ meaning either devil’s copper or St. Nicholas’s copper. It was first mentioned in 1751 and observed by F. Cronstedt. The isolation was later accomplished and announced by F. Cronstedt. “Ni” is the canonical chemical symbol of nickel. Its atomic number in the periodic table of elements is 28 with location at Period 4 and Group 10, belonging to the d-block. The relative atomic mass of nickel is 58.6934(2) Dalton, the number in the brackets indicating the uncertainty.

Packaging of Neodymium Nickel Oxide Sputtering Target

Our Neodymium Nickel Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high purity Neodymium Nickel Oxide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.