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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0104 Nickel Manganese Sputtering Target, Ni/Mn

Chemical Formula: Ni/Mn
Catalog Number: ST0104
CAS Number: 7440-02-0 | 7439
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The nickel manganese sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality nickel manganese sputter targets at the most competitive prices.




Description

Nickel Manganese Sputtering Target

The nickel manganese sputtering target from Stanford Advanced Materials is an alloy sputtering material containing Ni and Mn.

NickelNickel is a chemical element that originated from the shortened of the German ‘kupfernickel’ meaning either devil’s copper or St. Nicholas’s copper. It was first mentioned in 1751 and observed by F. Cronstedt. The isolation was later accomplished and announced by F. Cronstedt. “Ni” is the canonical chemical symbol of nickel. Its atomic number in the periodic table of elements is 28 with a location at Period 4 and Group 10, belonging to the d-block. The relative atomic mass of nickel is 58.6934(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Nickel Sputtering Target

manganeseManganese is a chemical element originated from Either the Latin ‘magnes’, meaning magnet or from the black magnesium oxide, ‘magnesia nigra’. It was first mentioned in 1770 and observed by O. Bergman. The isolation was later accomplished and announced by G. Gahn. “Mn” is the canonical chemical symbol of manganese. Its atomic number in the periodic table of elements is 25 with a location at Period 4 and Group 7, belonging to the d-block. The relative atomic mass of manganese is 54.938045(5) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Manganese Sputtering Target

Nickel Manganese Sputtering Target Application

The nickel manganese sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Nickel Manganese Sputtering Target Packing

Our nickel manganese sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

High-quality nickel manganese sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

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Nickel Manganese Sputtering Target, Ni/Mn
Average rating:  
 1 reviews
by Jessica Garza on Nickel Manganese Sputtering Target, Ni/Mn

FYI: Keep the target clean before coating, so as to maintain the uniformity of the film.