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ST0174 Lutetium Oxide Sputtering Target, Lu2O3

Chemical Formula: Lu2O3
Catalog Number: ST0174
CAS Number: 12032-20-1
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The lutetium oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality lutetium oxide sputter targets at the most competitive prices.

Lutetium Oxide MSDS File




Description

Lutetium Oxide Sputtering Target Description

Lutetium oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Lu and O.

LutetiumLutetium is a chemical element that originated from Paris, France (with the Roman name Lutetia). It was first mentioned in 1906 and observed by G. Urbain and C.A. von Welsbach. The isolation was later accomplished and announced by G. Urbain and C.A. von Welsbach. “Lu” is the canonical chemical symbol of lutetium. Its atomic number in the periodic table of elements is 71 with a location at Period 6 and Group 3, belonging to the d-block. The relative atomic mass of lutetium is 174.967(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Lutetium Sputtering Target

OxygenOxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Oxide Ceramic Sputtering Target

Lutetium Oxide Sputtering Target Specification

Material Type Lutetium Oxide
Symbol Lu2O3
Color/Appearance White
Melting Point (°C) 2490
Density  9.42 g/cm3
Molecular Weight 397.93
Exact Mass 397.866

Lutetium Oxide Sputtering Target Application

The lutetium oxide Lu2O3 sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Packaging

Our lutetium oxide Lu2O3 sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM specializes in producing high purity lutetium oxide sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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Lutetium Oxide Sputtering Target, Lu2O3
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