Chemical Formula: Li4SiO4
CAS Number: 13453-84-4
Catalog Number: ST0453
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Lithium silicate sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality lithium silicate sputter targets at the most competitive price.
Lithium silicate sputtering target is a black sputtering material with the element Li, Si and O. It is a conductive ceramic solid electrolyte material for lithium-ion batteries.
Lithium is a chemical element originated from the Greek ‘lithos’, meaning stone. It was first mentioned in 1817 and observed by A. Arfwedson. The isolation was later accomplished and announced by W. T. Brande. “Li” is the canonical chemical symbol of lithium. Its atomic number in the periodic table of elements is 3 with location at Period 2 and Group 1, belonging to the s-block. The relative atomic mass of lithium is 6.941(2) Dalton, the number in the brackets indicating the uncertainty. Related: Lithium Sputtering Target
Silicon is a chemical element originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.
|Material Type||Lithium Silicate|
|Melting Point||1,256 °C|
|Available Sizes||Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Our lithium silicate sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High quality lithium silicate sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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