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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0453 Lithium Silicate (Li4SiO4) Sputtering Target

Chemical Formula: Li4SiO4
Catalog Number: ST0453
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Target Bonding of Lithium Silicate Sputtering Target

Elastomer bonding is available for Lithium Silicate Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.

Description of Lithium Silicate Sputtering Target

Lithium

LithiumLithium is a chemical element originated from the Greek ‘lithos’ meaning stone. It was first mentioned in 1817 and observed by A. Arfwedson. The isolation was later accomplished and announced by W. T. Brande. “Li” is the canonical chemical symbol of lithium. Its atomic number in the periodic table of elements is 3 with location at Period 2 and Group 1, belonging to the s-block. The relative atomic mass of lithium is 6.941(2) Dalton, the number in the brackets indicating the uncertainty.

Silicon

SiliconSilicon is a chemical element originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.

Packaging of Lithium Silicate Sputtering Target

Our Lithium Silicate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high purity Lithium Silicate Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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Lithium Silicate (Li4SiO4) Sputtering Target
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