Chemical Formula: LaVO3
Catalog Number: ST0165
CAS Number: 12142-65-3
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The lanthanum vanadium oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality lanthanum vanadium oxide sputter targets at the most competitive prices.
Lanthanum vanadium oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing La, V and O.
Lanthanum, a soft, malleable, silvery-white white metal, is one of the most reactive rare earth elements. It can be utilized to make special optical glasses and can also be utilized to make steel more malleable. In addition, lanthanum is helpful in wastewater treatment and oil refining. Scientists have given the name of “super calcium” to Lanthanum due to its application of photoconversion film.
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Vanadium is a chemical element that originated from Vanadis, an Old Norse name for the Scandinavian goddess Freyja. It was first mentioned in 1801 and observed by M. del RÃo. The isolation was later accomplished and announced by N.G.SefstrÃ¶m. “V” is the canonical chemical symbol of vanadium. Its atomic number in the periodic table of elements is 23 with a location at Period 4 and Group 5, belonging to the d-block. The relative atomic mass of vanadium is 50.9415(1) Dalton, the number in the brackets indicating the uncertainty.
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Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
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1. Indium Bonding is recommended for lanthanum vanadium oxide sputtering target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity are susceptible to thermal shock.
The lanthanum vanadium oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our lanthanum vanadium oxide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High-quality lanthanum vanadium oxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.
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