(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0443 Lanthanum Copper Oxide Sputtering Target, La2CuO4

Chemical Formula: La2CuO4
Catalog Number: ST0443
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Lanthanum copper oxide sputtering targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.


Lanthanum Copper Oxide Sputtering Target Description

Lanthanum copper oxide sputtering target is composed of lanthanum, copper, and oxygen with the chemical formula La2CuO4. High-purity lanthanum copper oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Lanthanum Sputtering TargetCopper Sputtering Target, Oxide Ceramic Sputtering Target


Lanthanum Copper Oxide Sputtering Target Specification

Material Type Lanthanum Copper Oxide
Symbol La2CuO4
Color/Appearance Solid
Melting Point N/A
Density 6.93 ~ 7.08 g/cm3
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Lanthanum Copper Oxide Sputtering Target Application

The lanthanum copper oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Lanthanum Copper Oxide Sputtering Target Bonding Services

Target Bonding Service is available for lanthanum copper oxide sputtering targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.

Lanthanum Copper Oxide Sputtering Target Packaging

Our lanthanum copper oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

We specialize in producing high-purity lanthanum copper oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

Submit your review

Create your own review

Lanthanum Copper Oxide Sputtering Target, La2CuO4
Average rating:  
 2 reviews
by Taylor Murphy on Lanthanum Copper Oxide Sputtering Target, La2CuO4

As a PhD student working on novel oxide materials for energy applications, I found the Lanthanum Copper Oxide sputtering target to be exceptionally reliable for creating thin films with the precise stoichiometry needed for my research. The consistency of the target material has been vital for the reproducibility of my results.

by Dennis Bowman on Lanthanum Copper Oxide Sputtering Target, La2CuO4

These are exactly as described. I got them for sputter coating experiment and they're ideal for that purpose.