Chemical Formula: (In2O3/Mo) 98/2 wt%
Catalog Number: ST0440
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Indium molybdenum oxide sputtering targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.
Indium molybdenum oxide sputtering target is composed of indium oxide and molybdenum with the chemical formula of In2O3/Mo or IMO. The composition ratio is 98 wt% and 2 wt%, respectively. High-purity indium molybdenum oxide sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
|Material Type||Indium Molybdenum Oxide|
|Type of Bond||Elastomer, Indium|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Other sizes are also available. Please contact us for customized sputtering targets.
The indium molybdenum oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our indium molybdenum oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high-purity indium molybdenum oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
Submit your review
I've bought sputtering materials from SAM several times. I highly recommend SAM’s products.