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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0149 Hafnium Oxide (HfO2) Sputtering Target

Chemical Formula: HfO2
Catalog Number: ST0149
CAS Number: 12055-23-1
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Target Bonding of Hafnium Oxide Sputtering Target

Indium Bonding and Elastomeric Target Bonding Service are available for Hafnium Oxide Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Target Bonding Services

Specification of Hafnium Oxide Sputtering Target

Material Type Hafnium Oxide
Symbol HfO2
Color/Appearance White, Crystalline Solid
Melting Point 2900 °C (5250 °F)
Boiling Point 5,400° C(9,752° F)
Density 9.7 g/cm3
Sputter RF, RF-R
Type of Bond Indium, Elastomer
Comments Film HfO

Available Sizes of Hafnium Oxide Sputtering Target

Material Size
Hafnium Oxide, HfO2 1.00″ Dia. x 0.125″ Thick
Hafnium Oxide, HfO2 1.00″ Dia. x 0.250″ Thick
Hafnium Oxide, HfO2 2.00″ Dia. x 0.125″ Thick
Hafnium Oxide, HfO2 2.00″ Dia. x 0.250″ Thick
Hafnium Oxide, HfO2 3.00″ Dia. x 0.125″ Thick
Hafnium Oxide, HfO2 3.00″ Dia. x 0.250″ Thick
Hafnium Oxide, HfO2 4.00″ Dia. x 0.125″ Thick
Hafnium Oxide, HfO2 4.00″ Dia. x 0.250″ Thick
Hafnium Oxide, HfO2 6.00″ Dia. x 0.250″ Thick
Hafnium Oxide, HfO2 8.00″ Dia. x 0.250″ Thick

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Description of Hafnium Oxide Sputtering Target

HafniumHafnium is a chemical element originated from Copenhagen, Denmark (with the Latin nameHafnia). It was first mentioned in 1911 and observed by G. Urbain and V. Vernadsky. The isolation was later accomplished and announced by D. Coster and G. von Hevesy. “Hf” is the canonical chemical symbol of hafnium. Its atomic number in the periodic table of elements is 72 with location at Period 6 and Group 4, belonging to the d-block. The relative atomic mass of hafnium is 178.49(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Hafnium Sputtering Target

OxygenOxygen is a chemical element originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Oxide Ceramic Sputtering Target

Packaging

Our hafnium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s hafnium oxide sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

 

 

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Hafnium Oxide (HfO2) Sputtering Target
Average rating:  
 1 reviews
by Mark Mitchell on Hafnium Oxide (HfO2) Sputtering Target

Love the look and the way they are packed.