(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0019 Hafnium Sputtering Target, Hf

Chemical Formula: Hf
Catalog Number: ST0019
CAS Number: 7440-58-6
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Target, Custom-made

Hafnium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) has extensive experience in manufacturing and supplying hafnium sputtering targets of the highest, most durable quality at competitive prices.

Hafnium Sputtering Target Safety Data Sheet



Hafnium Sputtering Target Description


Hafnium sputtering target has the same properties as hafnium metal. Hafnium is named after Hafnia, the Latin name for Copenhagen, where it was discovered. “Hf” is the canonical chemical symbol of hafnium. Hafnium is a lustrous, silvery gray, tetravalent transition metal which chemically resembles zirconium.

Hafnium Sputtering Target Specification

Material Type Hafnium
Symbol Hf
Atomic Number 72
Color/Appearance Gray Steel, Metallic
Melting Point 2227 °C
Density 13.31 g/cc
Sputter DC
Type of Bond Indium, Elastomer
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Hafnium Sputtering Target Application

Hafnium sputtering targets can be sputtered elementally or reactively with a partial pressure of oxygen introduced in the working gas to produce hafnium oxide thin films. Resultant films are used in a variety of applications including optical coatings for photonics, thin film resistors, corrosion resistance, nuclear products, gate insulators in integrated circuits and for sensors.

Hafnium Sputtering Target Bonding Services

Hafnium Sputter Targets can be bonded by Indium Bonding and Elastomer Bonding. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Target Bonding Services


Hf sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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High purity Hafnium sputtering targets are good magnetron sputtering materials. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Hafnium (Hf) Sputtering Target
Average rating:  
 1 reviews
by Mark M. on Hafnium (Hf) Sputtering Target

Great sputtering materials for my lab. Great quality, amazing price.

I love all of my stuff from SAM.