Chemical Formula: Hf
Catalog Number: ST0019
CAS Number: 7440-58-6
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Target, Custom-made
Hafnium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) has extensive experience in manufacturing and supplying hafnium sputtering targets of the highest, most durable quality at competitive prices.
Hafnium Sputtering Target Safety Data Sheet
Hafnium sputtering target has the same properties as hafnium metal. Hafnium is named after Hafnia, the Latin name for Copenhagen, where it was discovered. “Hf” is the canonical chemical symbol of hafnium. Hafnium is a lustrous, silvery gray, tetravalent transition metal which chemically resembles zirconium.
| Material Type | Hafnium |
| Symbol | Hf |
| Atomic Number | 72 |
| Color/Appearance | Gray Steel, Metallic |
| Melting Point | 2227 °C |
| Density | 13.31 g/cc |
| Sputter | DC |
| Type of Bond | Indium, Elastomer |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Hafnium sputtering targets can be sputtered elementally or reactively with a partial pressure of oxygen introduced in the working gas to produce hafnium oxide thin films. Resultant films are used in a variety of applications including optical coatings for photonics, thin film resistors, corrosion resistance, nuclear products, gate insulators in integrated circuits and for sensors.
Hafnium Sputter Targets can be bonded by Indium Bonding and Elastomer Bonding. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Hf sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High purity Hafnium sputtering targets are good magnetron sputtering materials. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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Great sputtering materials for my lab. Great quality, amazing price.
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