Chemical Formula: Gd2O3
Catalog Number: ST0148
CAS Number: 12064-62-9
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The gadolinium oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality gadolinium oxide sputter targets at the most competitive prices.
Gadolinium oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Gd and O.
Gadolinium is a chemical element that originated from Johan Gadolin, chemist, physicist and mineralogist. It was first mentioned in 1880 and observed by J. C. G. de Marignac. The isolation was later accomplished and announced by F. L. de Boisbaudran. “Gd” is the canonical chemical symbol of gadolinium. Its atomic number in the periodic table of elements is 64 with a location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of gadolinium is 157.25(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Gadolinium Sputtering Target
Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Oxide Ceramic Sputtering Target
|Material Type||Gadolinium Oxide|
|Melting Point||2,420° C (4,388° F)|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Indium Bonding and Elastomer Bonding are available for gadolinium oxide sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
The gadolinium oxide Gd2O3 sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our gadolinium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM specializes in producing high purity gadolinium oxide sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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Five Stars. Great product for the price!
I purchased this to use for my thesis experiment. Product is perfect for my purpose. Inexpensive, works great, product delivered was as listed.
The gadolinium oxide sputtering target I bought last week delivered just as requested and easy to put together. I will use SAM’s Products again. Great customer service.