(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0426 Barium Ferrite Sputtering Target, BaFe12O19

Chemical Formula: BaFe12O19
Catalog Number: ST0426
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Barium ferrite sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide with us.


Barium Ferrite Sputtering Target Description

Barium ferrite sputtering target is composed of barium, iron, and oxide with the chemical formula of BaFe12O19. High-purity BaFe12O19 sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Barium Sputtering TargetIron Sputtering Target

Barium Ferrite Sputtering Target Specification

Material Type Barium ferrite sputtering target
Symbol BaCe(1-x-y)Y(x)Zr(y)O3
Color/Appearance Solid
Melting Point 1300 °C
Density 5.28 g/cm3
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Barium Ferrite Sputtering Target Target Bonding

Elastomer and Indium bonding is available for the barium ferrite sputtering targets. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods, and services, please click here.

Barium Ferrite Sputtering Target Packaging

Our barium ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high-purity barium ferrite sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications.

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Barium Ferrite Sputtering Target, BaFe12O19
Average rating:  
 1 reviews
by Brandon Elefante on Barium Ferrite Sputtering Target, BaFe12O19

Super useful. The package is tight and the shipping is fast.