(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0888 Molybdenum Niobium Sputtering Target, Mo/Nb

Chemical Formula Mo/Nb
Catalog No. ST0888
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The Molybdenum Niobium Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality Molybdenum Niobium Sputtering Target at the most competitive prices.




Description

Molybdenum Niobium Sputtering Target Description

Molybdenum Niobium Sputtering Target is a solid material used in a sputtering process to deposit thin films of molybdenum niobium onto a substrate. Sputtering is a technique in which atoms are ejected from the surface of a target material and then deposited onto a desired substrate to create a thin film.

Molybdenum Niobium Sputtering Target is typically made in the form of a disc or plate and is placed in a sputtering chamber. The chamber is then filled with an inert gas, such as argon, and a high voltage is applied to the target material. As a result, the gas ions are accelerated toward the target surface, causing atoms to be ejected and transferred to the substrate, forming a thin film.

Molybdenum Niobium Sputtering Target Specifications

Compound Formula Mo/Nb
Appearance Gray metallic target
Melting Point ~2296℃
Density 9.2 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Molybdenum Niobium Sputtering Target Handling Notes

  1. Indium bonding is recommended for Molybdenum Niobium Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity, and is susceptible to thermal shock.

Molybdenum Niobium Sputtering Target Application

Molybdenum Niobium Sputtering Target allows for precise control of film thickness and uniformity, making it an essential tool in various thin film deposition applications, including optoelectronics, integrated circuits, solar cells, and magnetic recording media.

Molybdenum Niobium Sputtering Target Packaging

Our Molybdenum Niobium Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.

Get Contact

SAM’s Molybdenum Niobium Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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Molybdenum Niobium Sputtering Target, Mo/Nb
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