|Purity||99.9%, 99.95%, 99.99%, 99.995%, 99.999%|
|Shape||Discs, Plates, Column Targets, Step Targets, Custom-made|
The Lithium Zinc Oxide Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality Lithium Zinc Oxide Sputtering Target at the most competitive prices.
Lithium Zinc Oxide Sputtering Target is a specific material used in the process of sputtering, which is a technique used in thin film deposition for various applications such as electronics, optics, and coatings.
The sputtering target is made up of lithium zinc oxide (LiZnO), a compound composed of lithium (Li), zinc (Zn), and oxygen (O). It is typically in the form of a solid disc-shaped material with a high purity.
During the sputtering process, a high-energy plasma is created in a vacuum chamber, and ions in the plasma bombard the sputtering target. This bombardment causes atoms from the target material to be ejected or sputtered onto a substrate, creating a thin film coating.
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Our Lithium Zinc Oxide Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Lithium Zinc Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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