Chemical Formula: Na5Al3F14
Catalog Number: ST0249
CAS Number: 13775-53-6
Purity: 99.9%, 99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Sodium aluminum fluoride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality Na5Al3F14 sputtering targets at the most competitive price.
Sodium Aluminum Fluoride MSDS File
Sodium is a chemical element originated from the English word soda (natrium in Latin). It was first mentioned in 1807 and observed by H. Davy. The isolation was later accomplished and announced by H. Davy. “Na” is the canonical chemical symbol of sodium. Its atomic number in the periodic table of elements is 11 with location at Period 3 and Group 1, belonging to the s-block. The relative atomic mass of sodium is 22.98976928(2) Dalton, the number in the brackets indicating the uncertainty.
Aluminium, also called aluminum, is a chemical element originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminium. Its atomic number in the periodic table of elements is 13 with location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminium is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.
Fluorine, also called fluorin, is a chemical element originated from the Latin ‘fluere’, meaning to flow. It was first mentioned in 1810 and observed by A.-M. Ampère. The isolation was later accomplished and announced by H. Moissan. “F” is the canonical chemical symbol of fluorine. Its atomic number in the periodic table of elements is 9 with location at Period 2 and Group 17, belonging to the p-block. The relative atomic mass of fluorine is 18.9984032(5) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Fluoride Ceramic Sputtering Target.
The sodium aluminum fluoride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our sodium aluminum fluoride sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s sodium aluminum fluoride sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current pricing of sputtering targets and other deposition materials that are not listed.
