ST0980 Potassium Sodium Niobate Sputtering Target, KNaNb2O6

Potassium Sodium Niobate Sputtering Target Description

Potassium Sodium Niobate Sputtering Targets stand out in the semiconductor and electronics sectors, delivering stellar performance with their outstanding electrical properties. Notably, the chemical stability exhibited by Potassium Sodium Niobate Sputtering Targets during the film preparation process guarantees steadfastness in diverse environmental conditions, enhancing their applicability.

The alloy combination inherent in these targets introduces a remarkable feature – tunable physical properties. This attribute proves instrumental in thin film deposition, allowing for the customization of physical characteristics to meet the specific requirements of diverse applications. Whether in the realm of semiconductors, electronics, or optics, the multifaceted properties of Potassium Sodium Niobate Sputtering Targets position them as indispensable materials, driving advancements in thin film deposition and related applications across various high-tech industries.

Related Product: Potassium Niobate Sputtering Target, Potassium Sputtering Target

Potassium Sodium Niobate Sputtering Target Specifications

Potassium Sodium Niobate Sputtering Target Handling Notes

1. Indium bonding is recommended for the Potassium Sodium Niobate Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Potassium Sodium Niobate Sputtering Target Application

1. Semiconductor Manufacturing: In the semiconductor industry, Potassium Sodium Niobate Sputtering Targets are used for thin film deposition to provide excellent electrical performance support for the preparation of electronic components and integrated circuits.
2. Optical coatings: Due to their excellent physical properties, these targets play an important role in the preparation of optical coatings for the production of films with special optical properties, such as filters and lenses.
3. Electronic device manufacturing: Potassium Sodium Niobate Sputtering Targets are widely used in the manufacturing of electronic devices for the preparation of thin films to improve the performance and stability of electronic components.

Potassium Sodium Niobate Sputtering Target Packaging

Our Potassium Sodium Niobate Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Potassium Sodium Niobate Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications. Get an inquiry right now.