Chemical Formula: CeF3
Catalog Number: ST0237
CAS Number: 7758-88-5
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Cerium fluoride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality CeF3 sputtering targets at the most competitive price.
Cerium fluoride sputtering target is made of cerium fluoride, an ionic compound of the rare earth metal cerium and fluorine.
Cerium is a chemical element originated from Ceres, the Roman God of agriculture. It was first mentioned in 1803 and observed by H. Klaproth, J. Berzelius, and W. Hisinger. The isolation was later accomplished and announced by G. Mosander. “Ce” is the canonical chemical symbol of cerium. Its atomic number in the periodic table of elements is 58 with location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of cerium is 140.116(1) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Cerium Sputtering Target
Fluorine, also called fluorin, is a chemical element originated from the Latin ‘fluere’, meaning to flow. It was first mentioned in 1810 and observed by A.-M. AmpÃ¨re. The isolation was later accomplished and announced by H. Moissan. “F” is the canonical chemical symbol of fluorine. Its atomic number in the periodic table of elements is 9 with location at Period 2 and Group 17, belonging to the p-block. The relative atomic mass of fluorine is 18.9984032(5) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Fluoride Ceramic Sputtering Target.
|Melting Point||1460 °C|
|Boiling Point||2300 °C|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Indium Bonding is available for the CeF3 sputtering materials. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Cerium fluoride sputter targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s cerium fluoride sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current pricing of sputtering targets and other deposition materials that are not listed.