Designed for physical vapor deposition (PVD) processes, our Iron Silicon Boron (FeSiB) targets offer a tailored alloy composition that enables precise control over thin-film properties for demanding research and industrial applications.
| Material | Iron Silicon Boron Alloy (FeSiB) |
| Composition | Customizable (Fe-balanced with Si, B) |
| Form | Sputtering Target |
| Standard Purity | ≥ 99.5% (Metal Basis) |
Key Advantage: Engineered with controlled microstructure and uniform composition for consistent sputter rates and reliable film properties.
Customization: Full compositional ratio control, dimensions, and geometry (planar or rotary) tailored to your process.
Typical Applications: Advanced semiconductor layers, wear-resistant & hard coatings, magnetic thin films, and specialized research.
For detailed evaluation and procurement (Standard Reference: FE10669)
| Parameter | Specification / Capability | Notes / Process Relevance |
|---|---|---|
| Base Material | Iron Silicon Boron Alloy (FeSiB) | — |
| Key Elements | Fe (Balance), Si (1-10 at.%), B (1-10 at.%) | Composition is adjustable to achieve specific film characteristics. |
| Typical Purity | ≥ 99.5% (Metal Basis) | Controlled impurity levels ensure reproducible film performance. |
| Density | ≥ 95% of Theoretical | High density minimizes porosity for stable, low-particle sputtering. |
| Standard Form | Planar Target | Rotary targets and bonded assemblies available. |
| Dimensions | Fully Customizable | Diameter, thickness, or rectangular plates per your drawing. |
| Microstructure | Homogeneous, Fine Grained | Achieved via controlled metallurgical processing (e.g., vacuum melting, PM). |
| Backing Plate Option | Bonding to OFHC Cu or other plates available | Enhances thermal management and mechanical stability. |
| Certification | Certificate of Composition (CoC) provided | Guarantees compositional accuracy and traceability. |
1. Tailored Composition for Specific Film Properties
Unlike pure element targets, our FeSiB alloy targets allow for engineering film properties at the source. Silicon (Si) addition can enhance amorphous film formation and thermal stability, while Boron (B) is known to refine grain structure, increase hardness, and improve corrosion resistance in the deposited coating. We work with you to optimize the Fe/Si/B ratio for your specific application.
2. Consistency Through Advanced Manufacturing
Achieving a homogeneous distribution of Si and B within the iron matrix is critical to prevent segregation and ensure uniform erosion during sputtering. SAM employs techniques such as vacuum induction melting or advanced powder metallurgy, followed by rigorous homogenization treatments and spectroscopic analysis (e.g., GD-OES), to guarantee compositional uniformity across the entire target.
3. Application-Specific Guidance
Stanford Advanced Materials implements strict compositional and microstructural controls. Each FeSiB target batch is validated through techniques like Energy Dispersive X-ray Spectroscopy (EDS) and X-ray Diffraction (XRD) to confirm composition homogeneity and phase structure. A Certificate of Composition (CoC) is provided with every shipment.
Get a Formal Quote or Composition Datasheet
To receive a precise quotation and technical specifications, please provide:
