Fluorine (F) Evaporation Materials Archives

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Home / Evaporation Materials / By Chemical Elements / F

Aluminum Oxide Evaporation Materials

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VD0772 Aluminum Fluiride (AlF3) Evaporation Materials

Aluminum Oxide Evaporation Materials

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VD0773 Barium Fluoride (BaF2) Evaporation Materials

Aluminum Oxide Evaporation Materials

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VD0774 Cadmium Fluoride (CdF2) Evaporation Materials

Aluminum Oxide Evaporation Materials

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VD0775 Calcium Fluoride (CaF2) Evaporation Materials

Aluminum Oxide Evaporation Materials

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VD0776 Cerium Fluoride (CeF3) Evaporation Materials

Hafnium Oxide Evaporation Materials

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VD0777 Cesium Fluoride (CsF) Evaporation Materials

Aluminum Oxide Evaporation Materials

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VD0778 Chromium Fluoride (CrF3) Evaporation Materials

Aluminum Oxide Evaporation Materials

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VD0779 Dysprosium Fluoride (DyF3) Evaporation Materials

Aluminum Oxide Evaporation Materials

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VD0780 Erbium Fluoride (ErF3) Evaporation Materials

Aluminum Oxide Evaporation Materials

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VD0781 Gadolinium Fluoride (GdF3) Evaporation Materials

Hafnium Oxide Evaporation Materials

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VD0782 Hafnium Fluoride (HfF4) Evaporation Materials

Aluminum Oxide Evaporation Materials

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VD0783 Lithium Fluoride (LiF) Evaporation Materials

Aluminum Oxide Evaporation Materials

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VD0784 Lanthanum fluoride (LaF3) Evaporation Materials

Magnesium Fluoride Evaporation Materials

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VD0785 Magnesium Fluoride (MgF2) Evaporation Materials

Aluminum Oxide Evaporation Materials

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VD0786 Manganese Fluoride (MnF2) Evaporation Materials

Aluminum Oxide Evaporation Materials

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VD0787 Samarium Fluoride (SmF3) Evaporation Materials

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Sputtering Target
Bonding Service
Evaporation Materials
Evaporation Sources
- E-Beam Source Used Crucibles
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Planar Sputtering Target
Precious Metal
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Featured Products

ST0478 Zinc Oxide with Scandia (ZnO/Sc2O3 98/02 wt%) Sputtering Target
ST0477 Zinc Oxide with Manganese (ZnO 0.3 wt% Mn ) Sputtering Target
ST0476 Yttrium Manganate (YMnO3) Sputtering Target
ST0475 Yttrium Ferrite (Y3Fe5O12) Sputtering Target
ST0474 Titanium Silicate (Ti0.44Si0.10O) Sputtering Target

SPUTTERTARGETS

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. It was first established in 1994 to begin supplying high-quality rare-earth products to assist our customers in the research and development (R&D) fields.

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Recent Posts

How to Solve Common Problems in Magnetron Sputtering?
Major Problems and Answers in Coating Technology
Difference between Resistive Screen and Capacitive Screen
Study on the Influence of Sputtering Targets on Sputter Coatings
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