| Chemical Formula | CaMnO3 |
| Catalog No. | ST0893 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Calcium Manganate Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality Calcium Manganate Sputtering Target at the most competitive prices.
Calcium Manganate Sputtering Target is a type of thin film deposition material used in the process of physical vapor deposition (PVD). PVD is a method of depositing thin films of material onto a substrate by bombarding a solid target with high-energy particles in a vacuum chamber.
Calcium Manganate Sputtering Target consists of a solid disc made of a compound composed of calcium (Ca) and manganate (MnO3). The target is typically made by compressing and sintering powdered calcium manganate.
| Compound Formula | CaMnO3 |
| Appearance | White target |
| Molecular Weight | 143.01 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Calcium Manganate Sputtering Target is used in the production of Copper Indium Gallium Selenide (CIGS) solar cells, which are thin film photovoltaic devices. CIGS solar cells have high efficiency and are flexible, making them suitable for various applications such as building-integrated photovoltaics.
Our Calcium Manganate Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Calcium Manganate Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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