Chemical Formula: GeTe
Catalog Number: ST0322
CAS Number: 12025-39-7
Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Germanium telluride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is a trusted sputtering target supplier working with international partners to bring you the highest quality products with the most affordable pricing.
Germanium telluride sputtering target is a type of boride ceramic sputtering target composed of germanium and tellurium.
Germanium is a chemical element originated from Germany (with the Latin name Germania). It was first mentioned in 1886 and observed by A. Winkler. “Ge” is the canonical chemical symbol of germanium. Its atomic number in the periodic table of elements is 32 with location at Period 4 and Group 14, belonging to the p-block. The relative atomic mass of germanium is 72.64(1) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Germanium Sputtering Target
Tellurium is a chemical element originated from Earth, the third planet on solar system (with the Latin word tellus). It was first mentioned in 1782 and observed by F.-J.M. von Reichenstein. The isolation was later accomplished and announced by H. Klaproth. “Te” is the canonical chemical symbol of tellurium. Its atomic number in the periodic table of elements is 52 with location at Period 5 and Group 16, belonging to the p-block. The relative atomic mass of tellurium is 127.60(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Telluride Ceramic Sputtering Target
|Melting Point||725 °C|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
1. Indium bonding is recommended for germanium telluride sputtering target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity, and is susceptible to thermal shock.
Our germanium telluride sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s germanium telluride sputtering targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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great price & quality. Will buy it again.