ST11220 Zinc (Zn) Rotary Sputtering Target

Complete Technical Specifications & Capabilities

Technical specifications for industrial-scale zinc film deposition using rotary magnetron sputtering.

Technical & Application Deep Dive

1. Industrial-Scale Transparent Conductive Oxide (TCO) Production

Zinc rotary targets are the preferred source for manufacturing aluminum-doped zinc oxide (AZO) on an industrial scale:

• Thin-Film Photovoltaics: AZO deposited from Zn rotary targets serves as the front transparent electrode in silicon thin-film and CIGS solar cells. The rotary design enables uniform coating over meter-wide glass substrates with excellent optical and electrical properties at a lower cost than ITO.
• Large-Area Displays & Touch Panels: For emerging technologies like OLED lighting and large-format touch screens, rotary-sputtered AZO provides a scalable, cost-effective transparent conductive solution.
• Process Advantages: Reactive sputtering from a metallic Zn target (with oxygen and aluminum doping) offers better process control and higher deposition rates compared to sputtering from a ceramic ZnO:Al target.

2. High-Throughput Corrosion Protection Coatings

The rotary configuration is ideal for applying uniform zinc coatings for corrosion prevention:

• Galvanic Protection: Sputtered zinc films provide a pure, dense, and well-adhered sacrificial layer on steel and other metals. The rotary system allows for continuous, high-speed coating of strips, coils, or large parts.
• Superior to Traditional Methods: Offers better thickness control, uniformity, and adhesion than hot-dip galvanizing for precision components, with no thermal distortion and the ability to coat complex geometries.
• Alloy Coatings: Can be used in co-sputtering configurations to deposit zinc alloy coatings (e.g., Zn-Ni, Zn-Ti) with enhanced corrosion resistance for automotive and aerospace applications.

3. Advantages of Rotary Sputtering for Zinc

The tubular rotary design addresses key challenges in zinc sputtering:

• Enhanced Thermal Management: Continuous rotation improves heat dissipation from the sputtering surface, mitigating the risk of localized melting due to Zn’s low melting point, thereby enabling stable high-power operation.
• Maximized Material Utilization: Erosion occurs uniformly around the tube’s circumference, typically achieving >50% utilization compared to <30% for planar targets, dramatically reducing material cost in high-volume production.
• Unmatched Uniformity: Provides excellent thickness uniformity (often <±3%) over very wide substrates, which is critical for the performance of TCOs in solar cells and optical coatings.
• Reduced Particulates & Arcing: The constantly moving surface helps prevent nodule formation and reduces arcing, leading to cleaner films with fewer defects—essential for electronic applications.

Quality Assurance & Manufacturing

Stanford Advanced Materials employs specialized processes for rotary zinc target fabrication:

• High-Purity Tubular Fabrication: Utilizes extrusion or centrifugal casting of high-purity zinc to create seamless tubes with uniform grain structure, minimizing porosity and ensuring consistent sputtering behavior.
• Precision Dimensional Control: OD, ID, wall thickness, and straightness are meticulously controlled to ensure proper fit in rotary cathodes and balanced rotation.
• Surface Oxidation Prevention: Final machining and cleaning are performed under controlled atmosphere or with appropriate coolants. Targets are often passivated or packaged in nitrogen-filled bags to preserve the metallic surface.
• Balancing: Rotary targets are dynamically balanced to ensure vibration-free operation at typical rotation speeds, protecting both the target and the sputtering system.

Why Choose SAM for Your Zinc Rotary Targets?

• Industrial Coating Specialists: We understand the throughput, uniformity, and cost-per-unit-area demands of large-scale coating applications.
• Expertise in Rotary Target Geometry: Precision manufacturing ensures our tubular targets provide stable, long-lasting performance with maximum material utilization.
• Focused on TCO & PV Markets: Our targets are optimized for reactive sputtering processes to produce high-performance AZO films for the solar and display industries.
• Full Customization & Integration Support: We design targets to match your specific rotary cathode system and provide technical support for process optimization.

Next Steps: Get a Custom Quote

To receive a formal quotation or technical consultation, please provide:

1. Your rotary cathode system model or required tube dimensions (OD, ID, Length).
2. Target application (e.g., AZO for solar cells, pure Zn corrosion coating, ZnO for optics).
3. Required purity level and estimated annual consumption.
4. Any specific film performance requirements (e.g., sheet resistance, transparency).