Our Nickel Niobium (NiNb) Rotary Sputtering Targets are engineered for depositing advanced alloy films where a combination of high-temperature stability, strength, and specific functional properties is required. The Ni-Nb system enables the formation of intermetallic and solid solution phases crucial for demanding aerospace, energy, and specialized industrial applications.
| Material | Nickel Niobium Alloy (NiNb) |
| Typical Composition | Customizable (e.g., Ni-20Nb, Ni-60Nb at.%) |
| Purity | ≥ 99.5% (Metal Basis) |
| Form | Rotary Sputtering Target (Tubular) |
Key Advantage: Enables deposition of films with unique intermetallic phases (e.g., Ni3Nb, NiNb) offering high strength, thermal stability, and corrosion resistance unattainable with pure metals or simple solid solutions.
Customization: Ni:Nb atomic ratio, tube dimensions (OD, ID, Length), and bonding fully customizable.
Typical Applications: High-temperature protective coatings (e.g., for turbine blades), corrosion-resistant layers in aggressive environments, diffusion barrier research, and superconducting film precursors (e.g., A15 phase Ni3Nb).
For detailed evaluation and procurement (Standard Reference: ST11204).
| Parameter | Specification / Typical Value |
|---|---|
| Material | Nickel Niobium Alloy (NiNb) |
| Composition Range | Fully customizable (e.g., 5-60 at.% Nb) |
| Purity (Metal Basis) | ≥ 99.5% |
| Key Phases | Solid Solution (γ-Ni), Intermetallics (γ”-Ni3Nb, δ-NiNb) depending on composition & treatment |
| Melting Point Range | ~1300 – 1600°C (Alloy dependent) |
| Standard Shape | Tubular (Rotary Target) |
| Key Dimensions | Custom OD, ID, Length |
| Sputtering Method | DC Magnetron |
| Bonding/Integration | Compatible with rotary cathode systems |
| Certification | Certificate of Composition (CoC) provided |
The Ni-Nb phase diagram features several stable intermetallic compounds. By controlling the target composition, we enable the deposition of films with tailored phases:
NiNb alloy targets serve as precursors for cutting-edge material research:
For applications requiring uniformity over large areas or high-volume research, rotary targets are essential:
We employ X-ray Diffraction (XRD) to identify the primary phases present in the alloy target. Inductively Coupled Plasma (ICP) analysis precisely quantifies the Ni:Nb ratio. This ensures the target provides a consistent and well-defined source material for your deposition process.
Get a Formal Quote or Composition Consultation
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