Our Cobalt Planar Sputtering Targets are manufactured from the highest purity cobalt to meet the demanding requirements of modern semiconductor front-end processing and high-density magnetic recording, where film purity and microstructure directly dictate device performance and reliability.
| Material | Cobalt (Co) |
| Purity | ≥ 99.99% (4N) |
| Form | Planar Sputtering Target |
| Shape | Rectangular (Standard) |
Key Advantage: Exceptionally high purity minimizes metallic impurities that can degrade electrical and magnetic properties, enabling superior performance in nanoscale devices.
Customization: Purity (up to 99.995%), dimensions (thickness, length, width), and bonding fully customizable.
Typical Applications: Semiconductor diffusion barriers & liners (≤10 nm nodes), magnetic recording media & read/write heads, wear-resistant industrial coatings, and catalyst layers.
For detailed evaluation and procurement (Standard Reference: ST11176).
| Parameter | Specification / Typical Value |
|---|---|
| Material | Cobalt (Co) |
| Purity (Standard) | ≥ 99.99% (4N) |
| Available Purity | 99.95%, 99.99%, 99.995% |
| Density | ≥ 8.85 g/cm³ (Theoretical: 8.90 g/cm³) |
| Crystal Structure | Hexagonal Close-Packed (HCP) at RT |
| Magnetization (Saturation) | ~1.7 T (Bulk, Typical) |
| Standard Shape | Rectangular |
| Standard Size (Example) | 30 x 30 x 10 mm (Fully Customizable) |
| Electrical Resistivity | ~6.24 µΩ·cm (20°C) |
| Melting Point | 1495 °C |
| Thermal Conductivity | 100 W/(m·K) |
| Sputtering Method | DC Magnetron (Primary) |
| Bonding Options | Bonding to Cu, Mo, or SS backing plate |
| Certification | Certificate of Analysis (CoA) provided |
1. The Purity Imperative for Advanced Nodes
In semiconductor manufacturing, cobalt has emerged as a critical material for ultrathin barriers, liners, and contact layers at sub-10 nm technology nodes. At these scales, even trace impurities (Fe, Ni, etc.) can drastically increase via/line resistivity and compromise device reliability. Our 99.99%+ purity targets are engineered to meet this challenge, with CoA documenting critical impurity levels.
2. A Key Material for Magnetic Thin Films
Cobalt and its alloys are the workhorse materials for magnetic recording media and read/write head sensors (e.g., in GMR, TMR structures). The magnetic anisotropy, coercivity, and magnetostriction of the sputtered film are highly sensitive to the target’s purity and grain structure. Our targets provide a consistent, high-quality source for depositing these performance-defining layers.
3. Application-Specific Guidance
Every cobalt target undergoes Glow Discharge Mass Spectrometry (GDMS) or comparable high-sensitivity analysis to quantify trace metallic impurities at ppm/ppb levels. Microstructural analysis ensures a fine, uniform grain size to promote smooth sputtering. All data is captured in a detailed CoA, providing full traceability for your high-value fabrication processes.
Get a Formal Quote or CoA Sample
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