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ST11173 Sodium Phosphate (Na3PO4) Sputtering Target

Our Sodium Phosphate (Na₃PO₄) Sputtering Targets are specialized ceramic targets designed for the deposition of sodium-containing phosphate thin films. These films are of significant interest in the development of next-generation energy storage technologies, particularly as solid electrolytes for sodium-ion and solid-state batteries, as well as in specialized optical and dielectric applications.

Material Sodium Phosphate (Na₃PO₄)
Typical Purity ≥ 99.9%
Form & Shape Planar Sputtering Target (Round/Disc)
Crystal Phase Amorphous or Crystalline (as processed)
Key Properties Sodium Ion Conductor | High Thermal Stability | Dielectric Material
Key Advantage Provides a controlled, high-purity source of sodium and phosphate for depositing thin-film solid electrolytes, enabling research and development in advanced sodium-based electrochemical devices.

Key Advantage: Enables precise deposition of sodium phosphate films with controlled stoichiometry and microstructure, which is critical for achieving high ionic conductivity and stability in thin-film solid-state electrolytes.

Customization: Purity, dimensions (standard Dia. 75mm x 5mm Thick), density, and phase (amorphous vs. crystallized) can be tailored to specific research or process requirements.

Primary Applications: Solid electrolyte layer in thin-film sodium-ion and solid-state batteries; sodium source layer in electrochemical devices; dielectric or protective coating in specialized optics; research on sodium-ion conduction mechanisms.




Description

Complete Technical Specifications & Capabilities

Specifications for depositing functional sodium phosphate films via RF sputtering.

Parameter Specification / Details
Material Trisodium Phosphate (Na₃PO₄)
Typical Purity ≥ 99.9%
Crystal Structure/Form Typically supplied in a densified ceramic form; films can be deposited as amorphous or crystalline (often hexagonal) depending on process conditions.
Density (Target) ≥ 90% of theoretical density (Theoretical ~2.54 g/cm³)
Melting/Decomposition Decomposes before melting (~1583°C)
Sodium Content ~42.1 wt% Na (Theoretical for Na₃PO₄)
Ionic Conductivity (Film) Strongly process-dependent. Crystalline Na₃PO₄ films can exhibit moderate Na⁺ ion conductivity, which can be enhanced by doping or creating composite structures.
Standard Shape & Size Round Planar Target: 75 mm Diameter x 5 mm Thickness (Standard)
Custom Dimensions Diameter, thickness, and shape (rectangular) fully customizable
Surface Finish Ground and polished for RF sputtering compatibility
Bonding Typically bonded to a copper backing plate using conductive epoxy or specialized bonding for efficient RF coupling and cooling
Manufacturing Method Ceramic processing: high-purity powder synthesis, followed by pressing and sintering under controlled atmosphere
Sputtering Method RF Magnetron Sputtering (Standard due to insulating nature)
Quality Documentation Certificate of Analysis with purity, phase (XRD), and major impurity data

Technical & Application Deep Dive

1. Enabling Next-Generation Sodium-Based Solid-State Batteries

The primary drive for Na₃PO₄ sputtering targets is energy storage research:

  • Thin-Film Solid Electrolyte: Sputtered Na₃PO₄ films can serve as the solid electrolyte layer in all-solid-state thin-film sodium batteries. Their role is to conduct Na⁺ ions between the cathode and anode while acting as an electronic insulator.
  • Advantages over Liquid Electrolytes: Solid electrolytes offer improved safety (non-flammable), potential for higher energy density, and better compatibility with high-capacity anode materials like sodium metal.
  • Material Challenges & Research Focus: Pure Na₃PO₄ has modest ionic conductivity. Research using these targets focuses on enhancing conductivity through methods like:
    • Doping: Co-sputtering with other materials to create doped phosphate phases (e.g., Na₃₋ₓMₓPO₄).
    • Nanocomposites: Creating two-phase composites (e.g., with Al₂O₃) to increase conductivity at grain boundaries.
    • Interface Engineering: Studying and optimizing the interface between the Na₃PO₄ electrolyte and electrode materials to reduce interfacial resistance.

2. Sodium Source Layer for Electrochemical Devices

Beyond electrolytes, Na₃PO₄ films serve other functions in device fabrication:

  • Sodium Reservoir: In devices where controlled sodium incorporation is needed, a thin Na₃PO₄ layer can act as a sodium source that diffuses into adjacent layers during annealing.
  • Passivation Layer: Phosphate-based glasses and ceramics are known for their chemical durability. Na₃PO₄ films could be explored as protective or passivating coatings on sensitive materials.

3. Sputtering Process for Complex Oxide Targets

Depositing films from a Na₃PO₄ target requires careful process control:

  • RF Sputtering Necessity: As an electrical insulator, RF magnetron sputtering is required to prevent charge buildup on the target surface.
  • Stoichiometry Transfer: Maintaining the Na:P:O ratio from target to film is challenging. Process parameters (power, pressure, substrate bias, oxygen partial pressure) must be optimized to achieve the desired film composition and avoid phosphorus or sodium loss.
  • Substrate Temperature & Crystallization: Depositing amorphous films at low temperature followed by a post-deposition anneal is a common strategy to control crystallization, grain size, and ultimately, ionic conductivity.
  • Hygroscopicity Consideration: Sodium phosphates can be hygroscopic. Targets and deposited films may require careful handling and storage in dry environments.

Quality Assurance & Manufacturing

Stanford Advanced Materials implements specialized controls for ceramic phosphate targets:

  • High-Purity Precursor Synthesis: Starting materials are synthesized and purified to minimize contaminants that could act as charge carriers or degrade ionic conductivity.
  • Controlled Sintering Atmosphere: Sintering is performed under conditions that prevent decomposition, volatility loss of phosphorus or sodium, and unwanted phase formation.
  • Density & Microstructure Control: Targets are processed to high density to ensure mechanical strength and stable, arcing-free sputtering. Microstructure is examined to confirm homogeneity.
  • Phase and Composition Verification: XRD confirms the primary phase(s), and chemical analysis (e.g., ICP) verifies the Na:P ratio and impurity levels.

Why Choose SAM for Your Sodium Phosphate Targets?

  • Focus on Energy Materials: We specialize in supplying advanced materials for battery and energy storage research, understanding the critical need for purity and stoichiometric control.
  • Expertise in Complex Oxide Ceramics: We have the capability to fabricate high-quality, dense sputtering targets from challenging multi-cation oxide systems like phosphates.
  • R&D Partnership: We work closely with research institutions and companies developing solid-state batteries, offering material solutions and supporting process development.
  • Customization for Research: We can tailor target size, purity, and even explore modified compositions (e.g., pre-doped variants) to accelerate your research program.

Next Steps: Get a Custom Quote

To receive a formal quotation or technical consultation, please provide:

  1. Intended application (e.g., solid electrolyte for Na-ion battery, sodium source layer, other research).
  2. Required target dimensions (or standard 75mm diameter).
  3. Any specific requirements for phase (amorphous/crystalline precursor), density, or purity beyond standard 99.9%.
  4. If for co-sputtering or doping studies, any related compositional targets.
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