Engineered for advanced physical vapor deposition (PVD), our AlCrTiV quaternary alloy targets offer a unique combination of lightweight aluminum and strong transition metals (Cr, Ti, V), enabling the synthesis of novel high-entropy alloy (HEA) or multi-component nitride films with exceptional hardness, oxidation resistance, and thermal stability.
| Material | AlCrTiV Quaternary Alloy |
| Base Composition | Al : Cr : Ti : V ≈ 1:1:1:1 (at.% or wt.% customizable) |
| Purity | ≥ 99.9% (Metal Basis) |
| Form | Planar Sputtering Target |
Key Advantage: Enables deposition of complex, multi-functional alloy films (e.g., (AlCrTiV)N) with superior properties unattainable by simple binary or ternary systems.
Customization: Elemental ratios, dimensions, and bonding fully customizable to your research or production needs.
Typical Applications: Ultra-hard & wear-resistant tool coatings, oxidation-resistant thermal barrier coatings, decorative PVD coatings, and advanced materials research.
For detailed evaluation and procurement (Standard Reference: ST11169).
| Parameter | Specification / Capability | Notes / Process Relevance |
|---|---|---|
| Material Type | Quaternary Alloy (Al-Cr-Ti-V) | Can be classified as a High-Entropy Alloy (HEA) precursor. |
| Standard Composition | ~25 at.% each of Al, Cr, Ti, V (Equimolar) | Serves as a baseline for (AlCrTiV)N or other compound films. |
| Composition Flexibility | Fully Adjustable | Ratios can be optimized (e.g., higher Al for oxidation resistance, higher Ti/Cr for hardness). |
| Purity | ≥ 99.9% (Metal Basis) | High purity minimizes unintended impurities that could degrade coating performance. |
| Density | ~4.5 – 5.0 g/cm³ (Varies with composition) | High density achieved via vacuum arc melting or hot pressing. |
| Microstructure | Homogeneous, Single-Phase (BCC/FCC) or Multi-Phase | Controlled to ensure uniform sputtering and consistent film composition. |
| Standard Shape | Rectangular Planar Target | Circular and other geometries available. |
| Dimensions | Fully Customizable (Thickness ≥ 3mm recommended) | Sized to fit your magnetron assembly. |
| Sputtering Method | DC Magnetron, Pulsed-DC (Reactive capable) | Suitable for depositing both metallic alloy and nitride/oxide films. |
| Bonding Options | Indium, Epoxy, or Brazing to Cu/SS backing plate | Critical for thermal management during high-power sputtering. |
| Certification | Certificate of Composition (CoC) provided | EDX/WDS analysis verifies actual elemental ratios. |
1. The Power of Multi-Principal Element Alloys
The AlCrTiV system exemplifies the High-Entropy Alloy (HEA) concept, where multiple principal elements in near-equimolar ratios can form simple solid solution phases with unique properties. When sputtered, especially in a reactive nitrogen atmosphere, it can form ultra-hard nitride coatings ((Al,Cr,Ti,V)N) with excellent high-temperature stability and wear resistance, outperforming traditional TiN or CrN.
2. Tailoring Composition for Targeted Properties
The versatility of this quaternary system lies in its tunability:
3. Application-Specific Guidance
Achieving homogeneity in a four-element alloy is critical. SAM employs vacuum arc melting or powder metallurgy with subsequent homogenization heat treatments. Each target is verified using Energy Dispersive X-ray Spectroscopy (EDS) or Wavelength Dispersive Spectroscopy (WDS) to ensure compositional uniformity across the entire target face, guaranteeing that your deposited film matches the intended design.
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