| Chemical Formula | PrF3 |
| Catalog No. | ST0932 |
| CAS Number | 13709-46-1 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Praseodymium Fluoride Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) boasts extensive experience in providing Praseodymium Fluoride Sputtering Targets with both high purity and competitive pricing.
Praseodymium Fluoride Sputtering Target is used in sputter deposition processes to create thin films containing praseodymium fluoride. Praseodymium is often used in the production of magnets, lasers, and other technologies.
A sputtering target is a material used in a process called sputter deposition, which is a technique commonly employed in the manufacturing of thin films. Thin films find applications in various industries, including electronics, optics, and coatings. Sputtering is a physical vapor deposition (PVD) method where high-energy ions are used to dislodge atoms from a target material, and these atoms then deposit onto a substrate, forming a thin film.
Related Product: Praseodymium Nickel Oxide Sputtering Target
| Compound Formula | PrF3 |
| Molecular Weight | 197.9 |
| Appearance | Green target |
| Melting Point (℃) | 1395 |
| Density (g/cm3) | 6.3 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Praseodymium Fluoride Sputtering Target is used in sputter deposition processes to create thin films containing praseodymium fluoride. The use of praseodymium fluoride in thin films may have applications in optical coatings, sensors, and other electronic devices
Our Praseodymium Fluoride Sputtering Target is widely used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.
SAM’s Praseodymium Fluoride Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
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