| Chemical Formula | Ge2Sb2Te5 |
| Catalog No. | ST0886 |
| CAS Number | 243854-63-9 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Germanium Antimony Telluride Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality Germanium Antimony Telluride Sputtering Target at the most competitive prices.
Germanium Antimony Telluride Sputtering Target is a material used in thin-film deposition processes, particularly in the semiconductor industry. Sputtering is a form of physical vapor deposition (PVD) in which thin films are deposited on a substrate by bombarding a solid target material with high-energy ions.
GeSbTe is a compound semiconductor material that exhibits unique properties, making it suitable for various applications. It is commonly used in the production of phase-change random access memory (PRAM) devices, where its ability to switch between amorphous and crystalline states at different temperatures allows data storage and retrieval. GeSbTe-based thin films can also be used in other electronic devices, such as optical storage media, rewritable CDs, DVDs, and Blu-ray discs.
| Compound Formula | Ge2Sb2Te5 |
| Molecular Weight | 322 g/mol (GeSbTe) / 1026.8 (GeSbTe – Ge2Sb2Te5) |
| Appearance | Silvery-gray metallic target |
| Melting Point | >600℃ |
| Density | 6.35 g/cm3 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Germanium Antimony Telluride Sputtering Target is typically used in applications where a pure silicon film is required, such as in the fabrication of integrated circuits, solar cells, optical coatings, and other electronic and semiconductor devices.
Our Germanium Antimony Telluride Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Germanium Antimony Telluride Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and most petite possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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