Chemical Formula: ThF4
Catalog Number: ST0253
CAS Number: 13709-59-6
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Thorium fluoride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality ThF4 sputtering targets at the most competitive price.
Thorium fluoride sputtering target is a type of fluoride ceramic sputtering target composed of thorium and fluorine.
Thorium is a chemical element originated from Thor, the Scandinavian god of thunder. It was first mentioned in 1829 and observed by J. Berzelius. “Th” is the canonical chemical symbol of thorium. Its atomic number in the periodic table of elements is 90 with location at Period 7 and Group 3, belonging to the f-block. The relative atomic mass of thorium is 232.03806(2) Dalton, the number in the brackets indicating the uncertainty.
Fluorine, also called fluorin, is a chemical element originated from the Latin ‘fluere’, meaning to flow. It was first mentioned in 1810 and observed by A.-M. Ampère. The isolation was later accomplished and announced by H. Moissan. “F” is the canonical chemical symbol of fluorine. Its atomic number in the periodic table of elements is 9 with location at Period 2 and Group 17, belonging to the p-block. The relative atomic mass of fluorine is 18.9984032(5) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Fluoride Ceramic Sputtering Target
The thorium fluoride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our thorium fluoride sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s thorium fluoride sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current pricing of sputtering targets and other deposition materials that are not listed.
