Our Chromium Aluminum (CrAl) alloy sputtering targets combine the hardness of chromium with the exceptional high-temperature oxidation resistance of aluminum. Primarily used in reactive sputtering to deposit CrAlN or CrAl films, they enable the synthesis of next-generation coatings that outperform standard CrN or TiN in demanding high-temperature and aggressive environments.
| Material | Chromium Aluminum Alloy (CrAl) |
| Standard Composition | Cr:Al = 50:50 at.% (or 70:30 at.%) |
| Purity | ≥ 99.8% (Metal Basis) |
| Form | Sputtering Target |
Key Advantage: Tunable Cr/Al ratio allows optimization of coating hardness, oxidation resistance, and tribological properties for specific application needs.
Customization: Composition (any Cr:Al ratio), shape (round, rectangular), dimensions, and bonding fully customizable.
Typical Applications: High-speed cutting tools, forming tools & molds, components for aerospace & automotive engines, and decorative wear-resistant coatings.
For detailed evaluation and procurement (Standard Reference: ST11181).
| Parameter | Specification / Typical Value |
|---|---|
| Material | Chromium Aluminum Alloy (CrAl) |
| Standard Compositions | Cr₅₀Al₅₀, Cr₇₀Al₃₀ (at.%) |
| Composition Flexibility | Any Cr:Al ratio (10/90 to 90/10) |
| Purity (Metal Basis) | ≥ 99.8% |
| Density | ~3.5 – 4.5 g/cm³ (Alloy dependent) |
| Melting Point Range | ~1500 – 1850 °C (Alloy dependent) |
| Thermal Conductivity | 120 – 150 W/(m·K) |
| Standard Shapes | Round, Rectangular |
| Dimensions | Fully Customizable (Diameter/Thickness, L/W/T) |
| Sputtering Method | DC Magnetron (for metallic), Pulsed-DC Reactive (for nitrides) |
| Bonding Options | Bonding to Cu, Mo, or SS backing plates |
| Certification | Certificate of Composition (CoC) provided |
1. Engineering Coatings for Extreme Conditions
The synergy between Cr and Al in a nitride coating (CrAlN) creates a material that excels where others fail:
2. The Importance of Alloy Homogeneity
A homogeneous distribution of Cr and Al in the target is non-negotiable. Inhomogeneity leads to local variations in sputter yield, causing fluctuations in film composition and compromising coating performance. SAM uses Vacuum Arc Melting or Powder Metallurgy with subsequent homogenization to achieve a uniform, single-phase or fine two-phase microstructure, ensuring consistent film deposition.
3. Application-Specific Guidance
We guarantee compositional accuracy and homogeneity. Each batch is analyzed via Inductively Coupled Plasma (ICP) to verify the bulk Cr/Al ratio. Scanning Electron Microscopy with Energy Dispersive X-ray Spectroscopy (SEM/EDS) mapping is used to confirm the uniform elemental distribution across the target surface and cross-section, a critical factor for reactive sputtering stability.
Get a Formal Quote or Composition Consultation
To select the optimal CrAl target for your coating process, please provide: