ST11172 Aluminum Zinc Indium Silicon Planar Target, AlZnInSi Target

Complete Technical Specifications

For detailed evaluation and procurement (Standard Reference: ST11172).

Technical & Application Notes

1. A Versatile Precursor for Complex Functional Oxides

This target is not for a single application but for materials discovery and optimization. It allows researchers to explore a vast compositional space in systems like:

• TCO Development: By reactively sputtering in oxygen, you can explore doped and multi-cation TCOs beyond standard ITO or AZO. Silicon doping, for instance, can potentially enhance stability or modify carrier concentration.
• High-Entropy Oxides/Nitrides (HEOs/HENs): The four principal elements in near-equimolar ratios can form single-phase high-entropy oxide or nitride films with potentially unique combinations of hardness, corrosion resistance, and electrical properties.
• Advanced Barrier Layers: Complex, amorphous multi-metal oxide or nitride films often exhibit superior diffusion barrier properties compared to simple binaries (e.g., TiN, TaN).

2. The Challenge and Assurance of Homogeneity

Creating a homogeneous alloy from four elements with different melting points and mutual solubilities (e.g., Al/In) is a significant metallurgical challenge. SAM employs techniques like arc melting with repeated flipping or mechanical alloying followed by spark plasma sintering (SPS) to achieve a uniform, fine-grained microstructure. This ensures that the sputtered flux accurately represents the intended bulk composition.

3. Primary Research & Development Applications

• Next-Generation Display & PV Technologies: For developing alternative TCOs with improved conductivity, transparency, flexibility, or cost profiles compared to ITO.
• Protective & Functional Coatings: Exploring new, ultra-hard, or highly corrosion-resistant multi-component ceramic coatings for aerospace, automotive, or cutting tools.
• Fundamental Materials Science: Studying phase formation, amorphous/crystalline transitions, and structure-property relationships in complex multi-cation thin-film systems.
• MEMS & Advanced Packaging: Investigating novel dielectric, barrier, or functional layers for microsystems.

Quality Assurance

Given the complexity, quality control is paramount. We provide a detailed Certificate of Composition (CoC) from inductively coupled plasma mass spectrometry (ICP-MS). Optional services include Electron Probe Microanalysis (EPMA) or WDS mapping to visually demonstrate elemental homogeneity across the target face, providing you with confidence in the reproducibility of your deposition experiments.

Why Stanford Advanced Materials (SAM)

• Specialist in Complex Alloys: We accept the challenge of fabricating homogeneous targets from difficult or immiscible element combinations.
• Partner in Research: We work closely with university and corporate R&D teams to fabricate custom compositions that push the boundaries of thin-film materials.
• Precision & Documentation: We provide the high-quality targets and detailed analytical data required for publishable and patentable research.

Discuss Your Project & Request a Custom Composition Quote

This is a collaborative development product. To proceed, please share:

1. Your target application/research goal (e.g., “developing a Si-doped IZO TCO” or “synthesizing AlZnInSiOx high-entropy oxide”).
2. Desired or starting compositional ratios (at.% or wt.% of Al, Zn, In, Si).
3. Target dimensions and any bonding requirements.