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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

Yttrium (Y) Sputtering Target

Chemical Formula:Y
Catalog Number:ST0057
CAS Number:7440-65-5
Purity:99.9%
Shape:Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Yttrium Description

YttriumYttrium is a chemical element originated from Ytterby, Sweden. It was first mentioned in 1794 and observed by J. Gadolin. The isolation was later accomplished and announced by G. Mosander. “Y” is the canonical chemical symbol of yttrium. Its atomic number in the periodic table of elements is 39 with location at Period 5 and Group 3, belonging to the d-block. The relative atomic mass of yttrium is 88.90585(2) Dalton, the number in the brackets indicating the uncertainty.

Specification of Yttrium (Y) Sputtering Target

Atomic Number 39
Density: 4.472 g·cm3
Color/Appearance Silvery White, Metallic
Thermal Conductivity 17.2 W/m.K
Melting Point: 1526 °C, 2779 °F, 1799 K
Boiling Point: 3336 °C, 6037 °F, 3609 K
Coefficient of Thermal Expansion 10.6 x 10-6/K
Theoretical Density (g/cc) 4.47
Z Ratio 0.835
Sputter RF, DC
Type of Bond Indium, Elastomer
Comments High Ta solubility

Target Bonding of Yttrium (Y) Sputtering Target

Indium Bonding and Elastomer Bonding are  recommended for Yttrium (Y) Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

target bonding

Packaging

Our Yttrium (Y) Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM specializes in producing high purity Yttrium (Y) Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.