Chemical Formula: Yb2O3
Catalog Number: ST0201
CAS Number: 1314-37-0
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The ytterbium oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality ytterbium oxide sputter targets at the most competitive prices.
Ytterbium oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material with the formula Yb2O3.
Ytterbium is a chemical element that originated from Ytterby, Sweden. It was first mentioned in 1878 and observed by J.C.G. de Marignac. The isolation was later accomplished and announced by G. Urbain. “Yb” is the canonical chemical symbol of ytterbium. Its atomic number in the periodic table of elements is 70 with a location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of ytterbium is 173.04(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Ytterbium Sputtering Target
Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Oxide Ceramic Sputtering Target
|Melting Point||2,355° C|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Our ytterbium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High-quality ytterbium oxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.