Chemical Formula: TiO2
Catalog Number: ST0197
CAS Number: 13463-67-7
Purity: >99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Titanium dioxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) provides a wide range of film coating materials with competitive price and great delivery time.
Titanium dioxide sputtering target from Stanford Advanced Materials contains Ti and O. Titanium dioxide, also known as titanium(IV) oxide or titania, is the naturally occurring oxide of titanium, chemical formula TiO2. Titanium dioxide occurs in nature as the minerals rutile and anatase, and additionally as two high pressure forms. One of these is a monoclinic baddeleyite-like form known as akaogiite, and the other is an orthorhombic α-PbO2-like form known as brookite, both of which can be found at the Ries crater in Bavaria. It is mainly sourced from ilmenite ore. This is the most widespread form of titanium dioxide-bearing ore around the world. Rutile is the next most abundant and contains around 98% titanium dioxide in the ore. The metastable anatase and brookite phases convert irreversibly to the equilibrium rutile phase upon heating above temperatures in the range 600–800 °C (1,112–1,472 °F).
|Material Type||Titanium (IV) Oxide|
|Theoretical Density||4.23 g/cc|
|Melting Point||1,830 °C|
|Type of Bond||Indium, Elastomer|
|Comments||Suboxide, must be reoxidized to rutile. Ta reduces TiO2 to TiO and Ti.|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Indium Bonding and Elastomeric Target Bonding Service are available for titanium dioxide sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our titanium oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
Titanium dioxide sputtering targets are good magnetron sputtering materials. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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My children used them for science experiment, worked exactly how they were suppodse to.