Chemical Formula: Bi2Te3
Catalog Number: ST0319
CAS Number: 1304-82-1
Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The bismuth telluride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality bismuth telluride sputter targets at the most competitive prices.
Bismuth telluride sputtering target is a type of boride ceramic sputtering target composed of bismuth and tellurium.
Bismuth is a chemical element originated from the German ‘Bisemutum’ a corruption of ‘Weisse Masse’ meaning white mass. It was early used in 1753 and discovered by C.F. Geoffroy. “Bi” is the canonical chemical symbol of bismuth. Its atomic number in the periodic table of elements is 83 with location at Period 6 and Group 15, belonging to the p-block. The relative atomic mass of bismuth is 208.98040(1) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Bismuth Sputtering Target
Tellurium is a chemical element originated from Earth, the third planet on solar system (with the Latin word tellus). It was first mentioned in 1782 and observed by F.-J.M. von Reichenstein. The isolation was later accomplished and announced by H. Klaproth. “Te” is the canonical chemical symbol of tellurium. Its atomic number in the periodic table of elements is 52 with location at Period 5 and Group 16, belonging to the p-block. The relative atomic mass of tellurium is 127.60(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Telluride Ceramic Sputtering Target
|Melting Point||585 °C|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
1. Indium bonding is recommended for bismuth telluride sputtering target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity, and is susceptible to thermal shock.
Our bismuth telluride sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s bismuth telluride sputtering targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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Perfect material for my chemical experiment! I got the exact purity of the sputtering target. Thank you soooo much.
The product was exactly as described.