(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0409 Rotatory Zirconium (Zr) Sputtering Target

Chemical Formula: Zr
Catalog Number: ST0409
CAS Number: 7440-67-7
Purity: 99.2%-99.95%
Thermal Conductivity: 22.7 W/m.K
Melting Point (°C): 1,852
Coefficient of Thermal Expansion: 5.7 x 10-6/K

Rotatory zirconium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is your one-stop source to find zirconium sputter targets for sale.


Rotatory Zirconium Sputtering Target Specification

ZirconiumRotatory zirconium sputtering target is a series of processed products of high-purity zirconium material, and it has a specific size and shape of high-purity zirconium material. It is used for vacuum coating.

Zirconium is a chemical element originated from the Persian ‘zargun’, meaning gold coloured. It was first mentioned in 1789 and observed by H. Klaproth. The isolation was later accomplished and announced by J. Berzelius. “Zr” is the canonical chemical symbol of zirconium. Its atomic number in the periodic table of elements is 40 with location at Period 5 and Group 4, belonging to the d-block. The relative atomic mass of zirconium is 91.224(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Zirconium Sputtering Target

Rotatory Zirconium Sputtering Target Specification

Dimension 5.5”-7” 5”-5.5” <138”

Material Type Zirconium
Symbol Zr
Melting Point 1,852 °C
Color/Appearance Silvery White, Metallic
Theoretical Density 6.49 g/cc

Rotatory Target VS. Planar Target

Comparing with planar targets, rotatory target contains more material and offers a greater utilization, which means longer production runs and reduced downtime of the system, increases the throughput of the coating equipment. Besides, rotary sputter target allows the use of higher power densities due to the heat build-up being spread evenly over the surface area of the target. As a consequence, an increased deposition speed can be seen along with an improved performance during reactive sputtering.


Our rotatory zirconium sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

SAM specializes in producing high purity rotatory zirconium sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Submit your review

Create your own review

Rotatory Zirconium (Zr) Sputtering Target
Average rating:  
 2 reviews
by Maria Williams on Rotatory Zirconium (Zr) Sputtering Target

I got exactly what I wanted to receive. Exact size as advertised. There are too many options of sizes. Will buy it again.

by Semih Ozsuca on Rotatory Zirconium (Zr) Sputtering Target

This works pretty well, handles everything within the given specification.