Chemical Formula: LaB6
Catalog Number: ST0295
CAS Number: 12008-21-8
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The lanthanum boride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality lanthanum hexaboride sputter targets at the most competitive prices.
Lanthanum boride sputtering target is a type of boride ceramic sputtering target composed of lanthanum and boron.
Lanthanum, a soft, malleable, silvery-white white metal, is one of the most reactive rare earth elements. It can be utilized to make special optical glasses and can also be utilized to make steel more malleable. In addition, lanthanum is helpful in wastewater treatment and oil refining. Scientists have given the name of “super calcium” to Lanthanum due to its application of photoconversion film.
Related Product: Lanthanum Sputtering Target
Boron is a chemical element originated from the Arabic ‘buraq’, which was the name for borax. It was first mentioned in 1808 and observed by L. Gay-Lussac and L.J. ThÃ©nard. The isolation was later accomplished and announced by H. Davy. “B” is the canonical chemical symbol of boron. Its atomic number in the periodic table of elements is 5 with location at Period 2 and Group 13, belonging to the p-block. The relative atomic mass of boron is 10.811(7) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Boron Sputtering Target
|Material Type||Lanthanum Hexaboride|
|Melting Point||2,210 °C|
|Type of Bond||Indium, Elastomer|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Indium Bonding and Elastomer Bonding are recommended for lanthanum boride Lab6 sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our lanthanum boride sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM specializes in producing high purity lanthanum boride Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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Good price, quick ship. The product is as described and would order again