(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0044 P-type Silicon Sputtering Target (P-doped Si)

Chemical Formula: Si
Catalog Number: ST0044
CAS Number: 7440-21-3
Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

P-type silicon sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality P-type silicon sputter targets at the most competitive price.


P-type Silicon Sputtering Target Description

SiliconP-type silicon sputtering target is dark gray with a bluish tinge. Silicon is a chemical element that originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with a location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.

P-type Silicon Sputtering Target Specification

Atomic Weight 28.0855
Atomic Number 14
Color/Appearance Dark Gray with a Bluish Tinge, Semi-Metallic
Thermal Conductivity 150 W/m.K
Melting Point 1,410 °C
Bulk Resistivity 0.005-0.020 OHM-CM
Coefficient of Thermal Expansion 2.6 x 10-6/K
Theoretical Density 2.32 g/cc
Dopant Boron
Z Ratio 0.712
Sputter DC, RF
Max Power Density* 40 Watts/Square Inch
Type of Bond Indium

P-type Silicon Sputtering Target Handling Notes

1. Indium bonding is recommended for P-type silicon sputtering target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc. 2. This material has a low thermal conductivity and is susceptible to thermal shock.

P-type Silicon Sputtering Target Application

The P-type silicon sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Other applications of silicon are:

  • Solar cells
  • Transistors
  • Semiconductors
  • Rectifiers and other solid-state devices that are used widely in the electronics and space sectors.

P-type Silicon Sputtering Target Packaging

Our P-type silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s P-type silicon sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

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P-type Silicon Sputtering Target (P-doped Si)
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by Eric Garcetti on P-type Silicon Sputtering Target (P-doped Si)

These silicon targets are really nice. They're made from very good raw materials. They are really well-made.