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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

Hafnium Oxide (HfO2) Evaporation Materials

Material Type: Hafnium Oxide
Symbol: HfO2
Color/Appearance: White, Crystalline Solid
Melting Point (°C): 2,758
Theoretical Density (g/cc): 9.68
Z Ratio: **1.00
E-Beam: Fair
E-Beam Crucible Liner Material: Direct in Hearth
Temp. (°C) for Given Vap. Press. (Torr): 10-4: ~2,500
Export Control (ECCN): 1C231
Comments: Film HfO.
Purity: 99.9% ~ 99.99%
Shape: Tablets/Pieces/Custom-made

Hafnium Oxide has a density of 9.68 g/cc, a melting point of 2,758°C, and a vapor pressure of 10-4 Torr at 2,500°C. It is off-white in color and generally considered to be one of the more stable hafnium compounds. Hafnium oxide has been utilized significantly in recent years as an addition to computer chips as a way to improve the speed and efficiency of processors.

Stanford Advanced Materials (SAM) is a leading manufacturer and supplier of high purity Hafnium Oxide Evaporation Materials and a wide variety of evaporation materials. We offer our evaporation materials in various forms. Customized forms are also available upon request.


Description of Hafnium Oxide:
High purity evaporation materials play a huge role in deposition processes to ensure high quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.99% purity hafnium oxide evaporation materials using quality assurance processes to guarantee product reliability.

Hafnium Oxide Evaporation Materials

• Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD) and physical vapor deposition (PVD).
• Used for optics including wear protection, decorative coatings, and displays.

Our evaporation materials are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.