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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST1010 Manganese Oxide Sputtering Target, Mn2O3

Chemical Formula Mn2O3
Catalog No. ST1010
CAS Number 1317-34-6
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) offers Manganese Oxide Sputtering Targets with exceptional purity, thanks to our extensive expertise in materials science. We deliver competitive pricing and tailor-made solutions that meet the most demanding applications in nanotechnology and thin-film deposition.


Manganese Oxide Sputtering Target Description

Manganese Oxide Sputtering Targets (Mn2O3) are essential materials used in thin film deposition processes. Mn2O3 is a compound composed of manganese and oxygen, known for its unique properties in electronic and optical applications. These sputtering targets facilitate the deposition of thin films with desirable characteristics such as high electrical conductivity, optical transparency, and thermal stability. Mn2O3 thin films find applications in various fields, including semiconductor manufacturing, solar cells, catalysis, and magnetic storage devices. With precise control over film thickness and composition, Manganese Oxide Sputtering Targets (Mn2O3) enable the production of advanced electronic and optoelectronic components for diverse industrial and research applications.

Related Product: Manganese Sputtering Target, Iron Manganese Sputtering Target

Manganese Oxide Sputtering Target Specifications

Compound Formula Mn2O3
Molecular Weight 157.88
Appearance Black Target
Melting Point 1080℃
Density 4.5 g/cm³
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Manganese Oxide Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Manganese Oxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Manganese Oxide Sputtering Target Application

  1. Semiconductor Devices: Mn2O3 thin films deposited using sputtering targets are employed in semiconductor manufacturing for the production of electronic devices such as transistors, capacitors, and diodes. Mn2O3 serves as a dielectric material, insulating layers, or barrier films, contributing to the functionality and performance of integrated circuits.
  2. Gas Sensors: Mn2O3 films are utilized in gas sensing applications for detecting gases like ammonia, hydrogen, and carbon monoxide. These sensors find applications in environmental monitoring, industrial safety, and automotive exhaust systems due to their high sensitivity and selectivity towards specific gases.
  3. Catalysis: Mn2O3 thin films serve as catalysts in various chemical reactions, including oxidation, hydrogenation, and decomposition processes. They are employed in industrial processes such as fuel production, environmental remediation, and chemical synthesis to enhance reaction rates and selectivity.
  4. Transparent Conductive Films: Mn2O3 coatings deposited from sputtering targets are used to produce transparent conductive films for applications in touchscreens, solar cells, and displays. These films exhibit a combination of electrical conductivity and optical transparency, enabling their use in optoelectronic devices.
  5. Magneto-optical Devices: Mn2O3 thin films are utilized in magneto-optical devices for manipulating light based on the magnetic field. They find applications in optical storage systems, magneto-optical data recording, and magnetic sensors for reading and writing information.
  6. Battery Electrodes: Mn2O3 is employed as an active material in lithium-ion batteries for cathodes due to its high capacity and stability. Thin films of Mn2O3 deposited from sputtering targets enable the fabrication of electrodes with improved energy storage and cycling performance.
  7. Research and Development: Manganese Oxide Sputtering Targets (Mn2O3) are also used in research laboratories for thin film deposition studies and material characterization. Researchers explore the properties of Mn2O3 films to develop new technologies and understand their behavior in different environments.

Manganese Oxide Sputtering Target Packaging

Our Manganese Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Manganese Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.