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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST1011 Chromium Silicide Sputtering Target, Cr3Si

Chemical Formula Cr3Si
Catalog No. ST1011
CAS Number 12018-36-9
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) proudly leverages extensive materials science expertise to offer competitively priced, exceptionally pure Chromium Silicide Sputtering Targets. With a commitment to excellence, SAM ensures the delivery of top-notch targets meeting rigorous standards in nanotechnology and thin-film deposition.


Chromium Silicide Sputtering Target Description

Chromium Silicide Sputtering Target is a vital material used in thin film deposition processes for various applications. Composed of chromium (Cr) and silicon (Si), this compound exhibits unique properties essential for electronic and optical applications. Chromium Silicide Sputtering Targets facilitate the deposition of thin films with desirable characteristics such as high electrical conductivity, thermal stability, and corrosion resistance. These thin films find applications in semiconductor manufacturing, solar cells, sensors, and magnetic storage devices. With precise control over film thickness and composition, Chromium Silicide Sputtering Targets enable the production of advanced electronic and optoelectronic components for diverse industrial and research applications.

Related Product: Chromium Sputtering Target, Chromium Cobalt Sputtering Target

Chromium Silicide Sputtering Target Specifications

Compound Formula Cr3Si
Molecular Weight 184.07
Appearance Silver Grey Target
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Chromium Silicide Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Chromium Silicide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Chromium Silicide Sputtering Target Application

  1. Semiconductor Manufacturing: Cr3Si thin films deposited using sputtering targets are used in semiconductor fabrication processes. They serve as crucial materials for the production of electronic devices such as transistors, diodes, and integrated circuits, contributing to the functionality and performance of semiconductor devices.
  2. Solar Cells: Cr3Si thin films are utilized in the manufacturing of solar cells to enhance their efficiency and durability. These films serve as essential components in photovoltaic devices, contributing to the capture and conversion of solar energy into electricity.
  3. Magnetic Storage Devices: Chromium Silicide Sputtering Targets are employed in the production of magnetic storage devices such as hard disk drives (HDDs) and magnetic tapes. Thin films of Cr3Si serve as recording media or magnetic layers, enabling data storage and retrieval in electronic devices.
  4. Sensors: Cr3Si films find applications in sensor technologies for detecting various environmental factors such as temperature, pressure, and gas concentrations. These sensors are utilized in the automotive, aerospace, and industrial sectors for monitoring and control purposes.
  5. Corrosion Protection: Cr3Si coatings deposited from sputtering targets are used to provide corrosion protection for metallic surfaces in harsh environments. These coatings offer excellent resistance against oxidation, moisture, and chemical corrosion, prolonging the lifespan of components and structures.
  6. Optical Applications: Cr3Si thin films are employed in optical coatings for enhancing the performance of optical components such as lenses, mirrors, and filters. These coatings improve the durability, reflectivity, and anti-reflective properties of optical surfaces in various optical systems and devices.
  7. Research and Development: Chromium Silicide Sputtering Targets are also utilized in research laboratories for thin film deposition studies and material characterization. Researchers explore the properties of Cr3Si films to develop new technologies and understand their behavior in different environments.

Chromium Silicide Sputtering Target Packaging

Our Chromium Silicide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Chromium Silicide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.