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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

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Introduction Physical Vapor Deposition (PVD) technology is at the forefront of materials science, continually evolving to meet the demands of various industries. In this article, we undertake a comprehensive exploration of the evolving trends in PVD technology. From the latest innovations to potential applications across different industries, we delve into the intricate landscape of PVD....
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Introduction Sputtering is a common thin-film deposition technique used in various industries, including semiconductors, optics, and surface coatings. A sputtering target is a key component in the process, as it is responsible for generating the material to be deposited onto a substrate. It is important to ensure that the sputtering target is used at a...
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Introduction The deposition rate is an important factor in the field of thin film deposition, as it directly affects the production efficiency and throughput of the process. In this article, we will discuss practical methods to increase the deposition rate for various deposition techniques. Hope that you can have a better understanding of the factors...
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What is PVD Coating? Physical vapor deposition (PVD) coating refers to various coating techniques in which thin layers are created on a substrate using physical techniques. Each technology has a unique set of benefits. PVD coating starts by depositing films with precise stoichiometries to achieve color PVD finishes (ratio of certain elements). Typically, a base...
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Main Methods of PVD Coating
Physical Vapor Deposition (PVD) is a thin-film coating technique that physically converts a solid or liquid source of material into gaseous atoms, molecules, or ions under vacuum, which are then deposited on the surface of a substrate to form a thin film. The PVD-coated film has the advantages of fast deposition speed, strong adhesion, good diffraction performance,...
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What is Hot Isostatic Pressing? Hot isostatic pressing is one of the methods popularly used to process chemical materials. In this method, a material is compressed in a furnace at temperatures between 1173 K to 2523 K and pressures between 100 to 200 MPa. It is quite similar to another process known as hot pressing....
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An Introduction to Cold Isostatic Pressing (CIP)
What is Cold Isostatic Pressing (CIP)? Cold isostatic pressing is a method of processing materials. It is quite similar to another process known as metal mold processing. CIP functions based on a principle proposed by Blaise Pascal. This principle is popularly known as Pascal’s law and it states that pressure applied in an enclosed fluid...
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