Introduction Gallium Arsenide (GaAs) wafers are an essential component in the production of high-performance electronic devices, and they have specific specifications that must be met to ensure their effectiveness. In this article, we will discuss the key specifications of GaAs wafers so that you can have a further understanding of this useful material. What Are...Continue Reading

Introduction Gallium Arsenide (GaAs) wafers have a variety of applications in the field of electronics, particularly in the production of high-performance electronic devices. In this article, we will explore some common applications of GaAs wafers for electronic device manufacturing and provide a better understanding of their properties and advantages. Properties of Gallium Arsenide Wafer Gallium...Continue Reading

  Introduction Gallium phosphide (GaP) is a compound semiconductor material that has gained increasing attention in the semiconductor industry. GaP wafers offer several advantages over traditional silicon wafers, including high efficiency, high-speed operation, and high power handling capabilities. In this article, we will talk about the benefits of using gallium phosphide wafers in electronic and...Continue Reading

Introduction Garnets (A3B2(SiO4)3) are a group of minerals commonly used as substrates, abrasives, and gemstones. Garnets share similar physical properties and crystal structures, yet they have disparities in chemical composition. Here, this article is going to explore the garnet family in the specific case of gadolinium gallium garnet. Hope that you can have a basic...Continue Reading

Introduction With the development of electronic devices, people pay more and more attention to wafers, chips, semiconductors, and integrated circuits. Everyone is trying to figure out the essence of chips. Their mind is full of questions. What is a wafer? What is a chip? What about their relations? What materials do we use to make...Continue Reading

Aluminum (Al) belongs to the main Group 13 (III, or boron group) of the periodic table. The Latin term alumen, which refers to potash alum or aluminum potassium sulfate, KAl(SO4)212H2O, is where the name aluminum originates. Aluminum is a light silvery white metal and the most common non-ferrous metal. Aluminum never appears in nature in the...Continue Reading

If you’ve ever heard of thin film coatings, then you might know about Sputtering! This involves materials being ejected from a source called a “target” onto a “substrate” like a silicon wafer. By injecting a reactive gas (usually oxygen or nitrogen) into the plasma, which is normally created by an inert gas like argon (the...Continue Reading

Introduction Electron beam evaporation and thermal evaporation are types of physical vapor deposition methods. Both processes have some similarities as well as differences. Ever wondered which of these processes is best for coating a substrate you’re working on? Read on. What is Physical Vapor Deposition? Physical vapor deposition is a method of coating substrates below...Continue Reading

Introduction Chemical vapor deposition is a coating method that is commonly used to produce thin films and coatings of very high quality. Gaseous reactants are usually used in this process. In chemical vapor deposition, you transport one or more volatile precursors to the reaction chamber. The volatile precursors usually decompose on a heated substrate surface...Continue Reading