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Blogs

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. We update every week about news and knowledge of sputtering targets and evaporation materials. Here are the blogs we published previously.

Everything about ito sputtering target
November 12, 2018, , , ,

Everything You Need to Know About ITO Sputtering Target

Definition of ITO Sputtering Target The full name of ITO is indium tin oxide, a composition of indium, tin, and oxygen with different proportions. The substance of ITO and ITO sputtering target is the same, the latter of which is actually a black-gray ceramic semiconductor formed by mixing indium oxide and tin oxide powder in...
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antireflective coating
November 7, 2018, ,

Optical Coating: What is Anti-Reflective Coating?

Why do you need anti-reflection coating? Anti-reflective coating is added to lenses to reduce glare caused by light hitting the back of the lenses, which is good for one’s vision. When light passes through the front and back surfaces of the lens, it not only produces refraction but also produces reflection. This kind of reflected...
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Metal Encyclopedia Seventeen Rare Earth Elements Introduction
October 30, 2018, , ,

Metal Encyclopedia: Seventeen Rare Earth Elements Introduction

Rare-earth element is a general term for 17 elements of lanthanides as well as scandium and yttrium in the chemical periodic table. Scandium and yttrium are included in rare earth element because they are often symbiotic with lanthanide elements in mineral deposits, and thus have similar chemical properties. Rare earth materials are important for many...
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Applications and Requirements of Titanium Sputtering Target in High-Tech Industries
October 26, 2018, ,

Applications and Requirements of Titanium Sputtering Target in High-Tech Industries

Requirements of Titanium Sputtering Target Titanium sputtering target is widely used in high-tech fields, such as electronics, information industry, home decoration, automobile glass manufacturing, etc. In these industries, titanium target is mainly used for coating the surface of components, such as integrated circuits, flat panel displays, or as a decorative coating, glass coating, etc. Different industries...
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tungsten crucible
October 22, 2018,

Tungsten Crucible: A Good Choice For Scientific Experiments

Tungsten crucibles are essential tools in both scientific research and industrial applications, prized for their remarkable resistance to high temperatures and corrosive environments. Crafted from tungsten, one of the metals with the highest melting point, these crucibles are uniquely suited to processes requiring extreme conditions, such as metal smelting and chemical experiments. Their ability to...
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Aluminum titanium sputtering target
October 17, 2018, ,

Why should you choose Aluminum Titanium sputtering target?

Aluminum titanium alloy Aluminum titanium alloy is a kind of metal material with high die-casting yield, high density, high strength and flexibility. The difference between aluminum titanium alloy and titanium aluminum alloy is the proportion of these two elements. The element appears earlier has a larger proportion. Aluminum titanium alloy usually contains 0.50 to 1.20%...
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AlN semiconductor wafer
October 15, 2018, ,

Introduction to Aluminum Nitride Semiconductor

Development of Semiconductor Materials 1 The first generation of semiconductor: represented by Si, Ge semiconductor materials; 2 The second generation of semiconductor: represented by GaAs, InP semiconductor materials; 3 The third generation of semiconductor: represented by several wide-bandgap semiconductor materials such as silicon carbide (SiC), gallium nitride (GaN), zinc oxide (ZnO), diamond, and aluminum nitride...
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different target shapes
October 11, 2018,

Things you should know about sputter coating

Almost all new sputter deposition equipment uses a powerful magnet to spiral the electrons to accelerate the ionization of the argon around the target, resulting in an increased probability of collision between the sputtering target and the argon ions, and thus the sputtering rate is increased. Generally, most metal films uses DC sputtering, while non-conductive...
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