Catalog No. CY2427 Size 10x10x1.0mm; 10x5x1.0mm Material SiO2 (quartz) Orientation (100)(101) A variety size of silicon dioxide (SiO2 quartz) crystal substrates can be offered by Stanford Advanced Materials (SAM). We have a professional sales team to offer a fast response within 24 hours and warm service.Continue Reading
Catalog No. CY2426 Size 10x10x0.33 mm or customed Surface Polished, One sides epi polished on Si face Orientation <0001> +/-0.5 Growth Method MOCVD A variety size of SiC silicon carbide crystal substrates can be offered by Stanford Advanced Materials (SAM). We have a professional sales team to offer a fast response within 24 hours and warm...Continue Reading
Catalog No. CY2424 Material MoS2 Density 5.06 g/cm3 Crystal Structure Hexagonal Growth Method Synthetic and Natural Molybdenum disulfide crystal of high quality is supplied in Stanford Advanced Materials (SAM). We customize the size and shape based on the design of the customer's device.Continue Reading
Catalog No. NB1310 Purity 99.9% Chemical Formula Nb Density 8.57 g/cm3 Shape Spherical Powder Melting Point 2477 °C Particle Size 1um,10um,45um or Customized Stanford Advanced Materials (SAM) offers high-purity Spherical Niobium Powder designed specifically for 3D Printing applications and advanced manufacturing techniques. As the additive manufacturing industry progresses, our portfolio of specialty powders expands to meet...Continue Reading
Chemical Formula: Si/Cr Catalog Number: ST0508 Purity: 99%~99.999% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made SAM’s Silicon Chromium Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor,...Continue Reading
Chemical Formula: Si/Al Catalog Number: ST0507 Purity: 99%~99.999% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made At SAM, we provide a range of Silicon Aluminum Sputter Targets in different forms, purities, sizes, and prices. Our expertise lies in producing high-purity physical vapor deposition materials, optimized for use in semiconductor, chemical vapor deposition, and physical vapor deposition applications in...Continue Reading
Chemical Formula: Ge/Si Catalog Number: ST0496 Purity: 99%~99.999% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made At SAM, we provide a range of Germanium Silicon Sputter Targets in different forms, purities, sizes, and prices. Our expertise lies in producing high-purity physical vapor deposition materials, optimized for use in semiconductor, chemical vapor deposition, and physical vapor deposition applications in...Continue Reading
Chemical Formula: Fe/Al/Si Catalog Number: ST0495 Purity: 99%~99.999% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made At SAM, we provide a range of Iron Aluminum Silicon Sputter Targets in different forms, purities, sizes, and prices. Our expertise lies in producing high-purity physical vapor deposition materials, optimized for use in semiconductor, chemical vapor deposition, and physical vapor deposition applications...Continue Reading
Chemical Formula: Au/Ge Catalog Number: ST0485 Purity: 99.99% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made The gold germanium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality sputtering targets at the most competitive prices.Continue Reading
