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PVD
Common Defects in Physical Vapor Deposition
Due to their excellent wear resistance, heat resistance and other properties, PVD coatings are widely used in various industries. However, the defects of the coating make it impossible to demonstrate all of its advantages. If you want to solve the defects in PVD coating, you must know these defects, at least you should know – what...
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What is Physical Vapor Deposition
What is PVD Coating Technology? Physical Vapor Deposition (PVD) is a thin film preparation technique that physically vaporizes the surface of a material source (solid or liquid) into gaseous atoms, molecules or partially ionized into ions under vacuum conditions. Then, a film having a specific function is deposited on the surface of the substrate by...
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advantages-and-disadvantages-of-ion-beam-sputtering
Ion Beam Sputtering Definition Ion beam sputtering (IBS), or ion beam deposition (IBD), is a thin film deposition technology that uses an ion source to deposit a sputtering target onto a substrate to produce the highest quality films with excellent precision. Compared to other PVD technologies, ion beam sputtering is more accurate and can accurately control...
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The sputtering target is an important material for physical vapor deposition, the most widely used technology for depositing materials. As its name suggests, “physical” means that the PVD coating method involves a purely physical process. During the physical vapor deposition, a solid target material is broken up into the vapor state (usually in a high...
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antireflective coating
Why do you need anti-reflection coating? Anti-reflective coating is added to lenses to reduce glare caused by light hitting the back of the lenses, which is good for one’s vision. When light passes through the front and back surfaces of the lens, it not only produces refraction but also produces reflection. This kind of reflected...
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electron beam evaporation process
Definition of e-beam evaporation E-beam evaporation is a type of PVD (physical vapor deposition) techniques, which directly heats the evaporation material (usually pellets) by using an electron beam under vacuum, and transports the vaporized material to the substrate to form a film. Working process of e-beam evaporation Electron beam evaporation is based on the evaporation...
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magnetron sputtering
Magnetron sputtering is a kind of physical vapor deposition (PVD) technology. The general sputtering method can be used to prepare a plurality of materials such as metal, semiconductor, insulator, etc., and has the advantages of simple equipment, easy control, large coating area, and strong adhesion. Magnetron sputtering has been developed since the 1970s. In addition...
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DC power supply
We have previously made a brief introduction of Five Sputter Coating Technologies, including unbalanced magnetron sputtering, radio frequency (RF) sputtering, direct current (DC) magnetron sputtering, mid-frequency alternating current (AC) magnetron sputtering and reactive magnetron sputtering. And today, we are going to talk about direct current (DC) sputtering in details. To begin with, let’s see the...
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Sputtering voltage
Sputter deposition rate is a parameter that characterizes the film formation rate. In addition to the influencing factors such as the type and pressure of the working gas, target type and area size of the “sputter etched area”, and target surface temperature and target surface magnetic field strength, the deposition rate is also directly affected...
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