Introduction to the Bismuth Sputtering Target What is a bismuth sputtering target? A bismuth sputtering target is a pure metal sputter target for film deposition. This product could be used to make thin films for multiple sectors, including semiconductors, glass coatings, LED, solar cells, and optical industries. Properties of bismuth target Bismuth (atomic symbol: Bi, atomic number: 83) is located in Period 6, Group 15, and...Continue Reading

One of the main applications of chromium is the production of stainless steel and chrome plating. The process of electroplating a thin layer of chromium onto a metal object can be done to add aesthetic appeal or to make the surface harder and more corrosion-resistant. Chrome plating can produce chromium layers as thin as 0.001...Continue Reading

Aluminum (Al) belongs to the main Group 13 (III, or boron group) of the periodic table. The Latin term alumen, which refers to potash alum or aluminum potassium sulfate, KAl(SO4)212H2O, is where the name aluminum originates. Aluminum is a light silvery white metal and the most common non-ferrous metal. Aluminum never appears in nature in the...Continue Reading

The foundation of plasma technology is a basic physical principle. When energy is applied to matter, solids become liquids, and liquids turn into gases. If yet more energy is applied, the gas is ionized and it enters the energy-rich plasma state, the fourth state of matter. Plasma is a word used to describe matter that...Continue Reading

Why Tungsten is Used for Furnace Heating The decision to use a particular material for heating is a function of the temperature range and conditions the material can tolerate. High-temperature furnaces must be capable of withstanding temperatures that melt materials like titanium. These furnaces, which are typically built of graphite, usually produce reactive carbon pollution...Continue Reading